Novel Fluoropolymer, Resist Compositions Containing The Same, and Novel Fluoromonomers

专利摘要:
The present invention is a polymer having an aliphatic monocyclic structure in the polymer main chain represented by the general formula Ma, comprising 1 to 99 mol% of structural unit M1, 1 to 99 mol% of structural unit M2a, and 0 to 98 mol% of structural unit N. It provides a fluorine-containing copolymer whose number average molecular weight is 500-1 million. This fluorine-containing copolymer has excellent dry etching resistance and transparency in the vacuum ultraviolet region. <Formula Ma> In the formula, the structural unit M1 is an ethylenic monomer having 2 or 3 carbon atoms, which is a structural unit derived from a monomer having one or more fluorine atoms, and the structural unit M2a forms an aliphatic monocyclic structure in the main chain represented by the following general formula (a). It is at least one structural unit, and structural unit N is a structural unit derived from the monomer copolymerizable with structural units M1 and M2a. <Formula a> Wherein R 1 represents a carbon number and an oxygen number forming a ring which may be substituted with a divalent hydrocarbon group having 1 to 8 carbon atoms, a hydrocarbon group or a fluorine-containing alkyl group which may be substituted with a hydrocarbon group or a fluorine-containing alkyl group. Is at least one hydrocarbon group selected from the group consisting of divalent hydrocarbon groups having an ether bond of 2 to 8, R 2 is an alkylene group having 1 to 3 carbon atoms forming a ring, and R 3 and R 4 are Are the same or different and are all divalent alkylene groups having 1 or 2 carbon atoms, n1, n2, n3 are the same or different and all are 0 or 1;
公开号:KR20040047885A
申请号:KR10-2004-7004896
申请日:2002-10-02
公开日:2004-06-05
发明作者:다까유끼 아라끼；다꾸지 이시까와；명천 고
申请人:다이킨 고교 가부시키가이샤；
IPC主号:

专利说明:

Novel Fluoropolymer, Resist Compositions Containing The Same, and Novel Fluoromonomers
[2] As the need for high integration of large-scale integrated circuits (LSI) increases, fine processing techniques are required for photolithography techniques. Shorter wavelengths than conventional g lines (wavelength 436 nm) or i lines (365 nm wavelength) are required. It has been tried and put into practical use using far ultraviolet rays, KrF excimer laser light (wavelength 248 nm) and ArF excimer laser light (wavelength 193 nm) as exposure light sources.
[3] In recent years, a process using a F ₂ laser light (wavelength 157 nm) in a vacuum ultraviolet region as a continuous ultra-fine processing technology has been examined, and has been promising as an exposure technology aiming at 0.1 μm of a future technology node.
[4] On the other hand, in pattern formation, the chemically amplified resist which is advantageous in terms of transparency, resolution, sensitivity, dry etching resistance, etc. in the energy beam of each wavelength is examined. A chemically amplified resist is, for example, a positive type resin, which is acid-produced by energy ray irradiation such as a resin and a light or electron beam that have a dissolution inhibiting effect by introducing a substituent which is deprotected by the action of an acid into a resin that is soluble in an alkaline developer. It is a photosensitive ray composition containing the compound which generate | occur | produces (henceforth "photoacid generator"). When the composition is irradiated with light or an electron beam, an acid is generated from the photoacid generator, and the acid deprotects the substituent that provided the dissolution inhibiting effect by postexposure bake (hereinafter also referred to as "PEB"). As a result, an exposed part becomes alkali-soluble and a positive resist pattern can be obtained by processing with alkaline developing solution. At this time, the acid acts as a catalyst and exerts an effect in a small amount. In addition, the acid function of the PEB is activated, the reaction is promoted chemically and the sensitivity is improved in a chain reaction.
[5] Examples of conventional resins used in such chemically amplified resists include protecting some or all of the hydroxyl groups of phenolic resins with protecting groups such as acetal and ketal (KrF resist), and introducing acid dissociable ester groups into the carboxyl groups of methacrylic acid resins. Thing (ArF resist), etc. are mentioned.
[6] However, these conventional polymers for resists have strong absorption in the vacuum ultraviolet wavelength region, but have low transparency (large absorption coefficient) in F ₂ laser light having a wavelength of 157 nm, which is being considered as an ultrafine patterning process. There is a fundamental problem. Therefore, in order to expose with F ₂ laser, it is necessary to make the thickness of the resist as thin as possible, and it is difficult to use it as a single layer F ₂ resist substantially.
[7] However, RRKunz, TMBloomstein et al. Compare the transparency of various materials at 157 nm in the Journal of Photopolymer Science and Technology (Vol. 12, No. 4 (1999) 561-569). The good transparency of fluorocarbons is described, suggesting the possibility of being a F ₂ resist.
[8] However, this document only describes that the transparency at 157 nm is high with respect to the existing fluorocarbon polymer, and the preferred specific structure of the fluorine-containing polymer is not described. For example, the synthesis of fluorine-containing polymers incorporating functional groups necessary for positive or negative chemically amplified resists is not even synthesized. Furthermore, there is no suggestion about the fluorine-containing base polymer material and the preferred resist composition using the same as the chemically amplified resist, and the possibility of forming the F ₂ resist pattern using the fluorine-containing polymer is not found at all.
[9] Later, AEFeiring et al., Of EI du Pont de Nemours and Company, disclose that certain fluoropolymers are useful for F ₂ resist applications. WO00 / 17712, published Mar. 30, 2000. Started on.
[10] This publication discloses a method of using a fluorine-containing polymer having a structural unit and a cyclic structure of a fluoroolefin, a unit structure mainly derived from norbornene.
[11] On the other hand, the introduction of the acid dissociable (or acid decomposable) functional group required for the positive resist into the fluoropolymer is an acid dissociable (or acid decomposable) functional group in monomers of acrylic, methacrylic, norbornene and vinyl esters. It carried out by copolymerizing the introduced monomer.
[12] After that, the EI du Pont de Nemours and Company's pay ring and the like are -C (Rf) (Rf ') OH or -C (Rf) (Rf') O-Rb-containing fluorine-containing polymer. Has been disclosed in Patent Publication WO00 / 67072 (November 9, 2000) that is useful for F ₂ resist applications.
[13] This publication discloses a structural unit of norbornene in which -C (Rf) (Rf ') OH or -C (Rf) (Rf') O-Rb is bonded through a site of -CH ₂ OCH _2- . . Further, norbornene derivatives containing -C (Rf) (Rf ') OH or -C (Rf) (Rf') O-Rb have been described as one of the examples of the fluorine-containing polymer used in the resist.
[14] However, these prior documents do not describe the use of a fluorine-containing copolymer comprising a structural unit of fluoroolepin and a structural unit having an aliphatic monocyclic structure in the main chain, and furthermore, a functional group required as a resist in the aliphatic monocyclic structure itself. It is not described about what was introduced.
[15] In addition, Katsuyama et al. Of Matsushita Denki Sangyo Co., Ltd. proposed a pattern formation method in exposure light having a wavelength of 1 nm to 180 nm using a resist material containing a halogen atom or the like (Japanese Patent Laid-Open No. 2000-321774). Bulletin, published 24 November 2000). However, it merely as a base resin for a resist containing a halogen atom, a methacrylic resin having a structural unit of a methacrylic acid ester having a group -CH ₂ CF _3, -CH (CF _{3) 2} in the side chain are described, in the main chain The thing which has a fluorine atom is not described, and also the polymer which has an aliphatic monocyclic structure in a principal chain is not described. In addition, there is no specific description of a polymer having a functional group capable of acting as a chemically amplified resist (positive or negative) in an aliphatic monocyclic structure.
[16] In general, it has been known that dry etching resistance is improved by introducing a norbornene skeleton into a polymer, but conventional norbornene derivatives are not sufficient in transparency, particularly in the vacuum ultraviolet region.
[17] The present inventors have found that fluoroolefins represented by tetrafluoroethylene have good copolymerizability with an unsaturated compound (monomer) of aliphatic monocyclic structure, thereby obtaining a novel fluorine-containing polymer. Conventionally, monocyclic compounds have been considered to have insufficient dry etching resistance as compared with bicyclic compounds, but copolymers of the fluoroolefins and aliphatic monocyclic structures of unsaturated compounds (monomers) obtained by the present invention are polycyclic unsaturated compounds. For example, it has been found to have dry etching resistance equal to or higher than that when norbornene is used.
[18] On the other hand, it was also found that the transparency in the vacuum ultraviolet region was excellent as compared with the case of using norbornene.
[19] In addition, as a result of examining the introduction of the acid-reactive functional group required as a resist, it was found that a specific ethylenic monomer having an acid-reactive functional group was found to have good copolymerizability in addition to the fluoroolefin and the monocyclic unsaturated compound (monomer). The introduction of acid-reactive functional groups was made possible. In addition, fluorine-containing polymers in which an acid-reactive functional group is directly introduced into the monocyclic structure have also been found, and in particular, novel monocyclic unsaturated compounds having a direct acid-reactive functional group and partially having a fluorine atom have also been found. Copolymers with fluoroolefins using these novel monocyclic unsaturated compounds have excellent dry etching resistance and high transparency when used for resists.
[1] The present invention relates to a novel fluorine-containing unsaturated cyclic compound, a novel fluorine-containing polymer having an aliphatic monocyclic structure in its main chain, and furthermore, to a chemically amplified photoresist composition having excellent transparency and improved dry etching resistance. It is about.
[89] 1 is a graph plotting ΔH and measured pKa calculated in Experimental Example 1. FIG.
[90] Best Mode for Carrying Out the Invention
[91] First, the first of the novel fluorine-containing polymer of the present invention will be described.
[92] The first of the novel fluorine-containing polymer of the present invention is a polymer having an aliphatic monocyclic structure in the polymer main chain represented by the general formula (Ma) as described above, wherein the structural unit M1 is 1 to 99 mol%, and the structural unit M2a is 1 to 99. It is a fluorine-containing polymer whose number average molecular weights are 500-1 million which contain mol% and structural unit N 0-98 mol%.
[93] <Formula Ma>
[94]
[95] In the formula, the structural unit M1 is an ethylenic monomer having 2 or 3 carbon atoms, which is a structural unit derived from a monomer having one or more fluorine atoms, and the structural unit M2a forms an aliphatic monocyclic structure in the polymer main chain represented by the following formula (a). The structural unit N is a structural unit derived from monomers copolymerizable with the structural units M1 and M2a.
[96] <Formula a>
[97]
[98] Wherein R ¹ represents a hydrocarbon group (but may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) forming a divalent ring having 1 to 8 carbon atoms, and an ether bond having 2 to 8 carbon atoms in total At least one hydrocarbon group selected from the group consisting of a hydrocarbon group (but may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) having a divalent ring, and R ² has 1 to 3 carbon atoms to form a ring Phosphorus alkylene group, R ³ and R ⁴ are the same or different, and are both divalent alkylene groups having 1 or 2 carbon atoms, n1, n2, n3 are the same or different and all are 0 or 1.
[99] The structural unit M2a constituting the monocyclic structure constitutes a ring with a divalent hydrocarbon group R ¹ and R ² , and R ² is not included, and both neighboring carbon atoms of the divalent hydrocarbon group R ¹ may be bonded to each other.
[100] The divalent hydrocarbon group R ¹ in the structural unit M2a is a divalent hydrocarbon group having 1 to 8 carbon atoms constituting the ring, and includes a hydrogen valent hydrocarbon group (for example, a hydrocarbon group having 1 to 20 carbon atoms, preferably An alkyl group having 1 to 5 carbon atoms, a fluorine-containing alkyl group (for example, a fluorine-containing alkyl group which may include an ether bond having 1 to 20 carbon atoms, preferably a fluorine-containing alkyl group which may include an ether bond having 1 to 5 carbon atoms) Or a perfluoroalkyl group which may include an ether bond). Moreover, unsaturated bond may also be included in R <^1> .
[101] The divalent hydrocarbon group R ¹ may also contain an ether bond, in which case the sum of the carbon atoms and oxygen atoms constituting the ring is 2 to 8. These R ^{1 may} likewise be substituted with the same hydrocarbon group or fluorine-containing alkyl group as described above, or may include an unsaturated bond.
[102] In the first fluorine-containing polymer of the present invention, the structural unit M2a forming the ring does not contain a functional group.
[103] The structural unit M2a is basically
[104]
[105] The structural unit derived from the aliphatic monocyclic unsaturated compound of the above-mentioned is mentioned preferably, Hydrogen atom contained in addition to these double bond carbon is a hydrocarbon group (for example, a C1-C20 hydrocarbon group, Preferably it is C1-C20) An alkyl group of 5), a fluorine-containing alkyl group (for example, a fluorine-containing alkyl group which may include an ether bond having 1 to 20 carbon atoms, preferably a fluorine-containing alkyl group which may include an ether bond having 1 to 5 carbon atoms, or an ether) And perfluoroalkyl groups which may include a bond).
[106] Among these, 3-membered ring and (in the formula (a), and n1, n2, n3 are both zero, the number of carbon atoms constituting the ring of R ¹ 1 Im), 5-membered ring (n1, n2 in the formula (a), n3 are both zero, the R ¹ The unsaturated compounds constituting the ring having 3 carbon atoms, the 8-membered ring (wherein n1, n2, n3 are all 0 in formula a, and having 6 carbon atoms constituting the ring of R ¹ ) are fluoroolefins and air. It is preferable at the point that synthesis | combination is favorable, and 3-membered ring and 8-membered ring are especially preferable.
[107] More specifically, it is preferable that the structural unit M2a is a structural unit represented by the following formula a-1, and the structural unit M2a is a structural unit represented by the following formula a-2.
[108]
[109] In formula, R <^6> is chosen from the group which consists of a hydrogen atom, the C1-C5 alkyl group, and the fluorine-containing alkyl group which may contain the C1-C5 ether bond, n6 is an integer of 0 or 1-12.
[110]
[111] In the formula, R ⁷ and R ⁸ are the same or different and are all selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a fluorine-containing alkyl group which may include an ether bond having 1 to 5 carbon atoms.
[112] The second of the novel fluorine-containing polymer of the present invention is a polymer having an aliphatic monocyclic structure in the polymer main chain represented by the following general formula (Mb), wherein the structural unit M1 is 1 to 99 mol% and the structural unit M2b is 1 to It is a fluorine-containing polymer whose number average molecular weights are 500-1 million which contain 99 mol% and the structural unit N 0-98 mol%.
[113] <Formula Mb>
[114]
[115] In the formula, the structural unit M1 and the structural unit N are the same as the general formula Ma, and the structural unit M2b is at least one structural unit which forms an aliphatic monocyclic structure in the main chain represented by the following general formula b.
[116] <Formula b>
[117]
[118] Wherein, R ¹ , R ² , R ³ , R ⁴ , n1, n2, n3 are the same as the above formula a, and Z is the same or different and all (Wherein Z ¹ is at least one functional group selected from the group consisting of functional groups protecting OH groups by protecting groups capable of reacting with OH groups, COOH groups, derivatives of carboxylic acid groups and acids and changing to OH groups, and R ⁵ is Divalent organic group, n5 is 0 or 1), and n4 is an integer of 1-3.
[119] These fluorine-containing polymers are those in which a portion Z having a functional group is introduced at a carbon atom that forms a ring structure equivalent to that of the structural unit M2a having the above-described ring structure, which imparts various useful functions to the polymer for photoresist and other uses, which are required for resist use. You can do it.
[120] In particular, resist applications are preferred in that polymers having excellent dry etching resistance and transparency can be obtained by introducing functional groups directly into the ring structure.
[121] Site Z having a functional group is represented by the formula The functional group Z ¹ is at least ^one functional group selected from the group consisting of OH groups, COOH groups, derivatives of carboxylic acid groups, and functional groups protecting OH groups by protecting groups which can react with acids and change into OH groups.
[122] Among these, the derivatives of the carboxylic acid group are specifically selected from carboxylic acid esters and functional groups that protect the COOH group by protecting groups that can react with acids to change to COOH groups, carboxylic acid halides, and acid amides. It is preferably a functional group protected by a COOH group by a protecting group capable of reacting with a carboxylic acid ester or an acid to be converted into a COOH group, for example, -COOR ¹⁰ (wherein R ¹⁰ is an alkyl group having 1 to 10 carbon atoms) or -COO-P is selected.
[123] A functional group protected by the functional group by a protecting group (-P) which can be reacted with an acid to be converted into a -COOH group (called "-COO-P") is, for example, a functional group required when used in positive resist applications. Before the reaction with the acid, the polymer is insoluble in the alkaline developer due to the action of the protecting group, but reacts with the acid from the photoacid generator, thereby leaving the protecting group (-P) to change into a COOH group and solubilizing in the alkaline developer.
[124] As a functional group (-COO-P) which has a protecting group which changes with -COOH group by reaction with an acid,
[125]
[126] Wherein R ²⁵ , R ²⁶ , R ²⁷ , R ²⁸ , R ²⁹ , R ³⁰ , R ³¹ , R ³² , R ³⁶ , R ³⁷ , R ³⁸ are the same or different and all have 1 to 10 hydrocarbon groups R ³³ and R ³⁴ are the same or different and are all H or a hydrocarbon group having 1 to 10 carbon atoms, and R ³⁵ is a divalent hydrocarbon group having 2 to 10 carbon atoms.
[127]
[128] In formula, R <^32> is the same as the said general formula, etc. are mentioned preferably.
[129] A functional group (called "-OP") protected by the protecting group (-P) which can be converted to an -OH group by reacting with an acid, for example, is a functional group required when used in positive resist applications. Before the reaction, the polymer is insoluble in the alkaline developer due to the action of the protecting group, but reacts with an acid from the photoacid generator to remove the protecting group (-P), thereby changing to an OH group, and solubilizing the alkaline developer.
[130] Specifically as a functional group (-O-P) which has a protecting group which changes with -OH group by reaction with an acid,
[131]
[132] In the formula, groups represented by R ²¹ , R ²² , R ²³ and R ²⁴ are the same or different and all are alkyl groups having 1 to 5 carbon atoms.
[133] More specifically
[134]
[135] Can be preferably exemplified, and among them, acid reactivity is good.
[136]
[137] Is preferable, and -OC (CH ₃ ) ₃ , -OCH ₂ OCH ₃ , and -OCH ₂ OC ₂ H ₅ are preferable in view of good transparency.
[138] R ⁵ at the site Z having a functional group may or may not be contained, and the functional group Z ¹ may be directly bonded to the ring structure.
[139] In the case of having R ⁵ , it is preferably selected from a divalent organic group, specifically, a divalent hydrocarbon group having 1 to 30 carbon atoms which may have an ether bond, and a divalent fluorine-containing alkyl having an ether bond having 1 to 30 carbon atoms. Ren groups are preferred.
[140] Particularly, the portion Z having a functional group is specifically represented by the _formula- (R ⁹ ) _n7 -COOR ¹⁰ (wherein R ⁹ may have an alkylene group which may have an ether bond having 1 to 10 carbon atoms, and may have an ether bond having 1 to 10 carbon atoms). Fluorine-containing alkylene group, R ¹⁰ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, n7 is 0 or 1), more specifically
[141]
[142] Etc. can be mentioned.
[143] In addition, Z is a chemical formula (Wherein R ¹¹ is an alkylene group which may have an ether bond having 1 to 5 carbon atoms or a fluorine-containing alkylene group which may have an ether bond having 1 to 5 carbon atoms, and R ¹² , R ¹³ are the same or different) A hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group having 3 to 10 carbon atoms, a fluorine-containing alkyl group having 1 to 10 carbon atoms which may have an ether bond, or a fluorine-containing aryl group having 3 to 10 carbon atoms which may have an ether bond. , n8 is 0 or 1), preferably having a fluorine atom, for example, a chemical formula (In the formula, Rf ¹ is contained in 1 to 10 carbon atoms which may have an ether bond in the fluorine-alkyl group, Rf ² is which may have a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, or an ether bond, having 3 to 10 carbon atoms When the structure represented by the C1-C10 fluorine-containing alkyl group, n9 is an integer of 0 or 1-5, n10 is 0 or 1 is used for a resist use, it is preferable at the point of transparency and solubility to a developing solution.
[144] Among the fluorine-containing alcohol structures, Rf ¹ and Rf ² are the same or different, and both of them are perfluoroalkyl groups having 1 to 5 carbon atoms, and are preferable in view of transparency and solubility in a developer.
[145] As an example of an alcohol structure
[146]
[147]
[148] And the like are preferred embodiments.
[149] In the second fluorine-containing polymer of the present invention, a preferable specific example of the structural unit M2b forming a ring is a structural unit represented by the following general formula (b-1), in which the moiety having a functional group included is the same as that described above. It can be illustrated as.
[150]
[151] In formula, Z and n4 are the same as that of general formula b.
[152] In addition, the present inventors have found that a specific diallyl compound having a functional group can be cyclized copolymerized with a fluoroolefin to obtain a fluorine-containing copolymer having a monocyclic structure in the polymer main chain.
[153] Accordingly, structural units of the following formula (b-2) and / or (b-3) can be obtained.
[154]
[155]
[156] In formula, Z and n4 are the same as the above.
[157] Specifically, as a diallyl compound, for example
[158]
[159] In the formula, when Z ⁵ is the same as Z and Z ⁶ is the same as H or Z described above, cyclization copolymerization with fluoroolefins using the diallyl compound represented by the following formulas b-4 and (Or) Structural units, such as the following general formula b-5, can be obtained.
[160]
[161]
[162] In formula, Z <^5> , Z <^6> is the same as the above.
[163] More specifically, in the formulas b-4 and b-5, Z ⁵ and Z ⁶ are the same or different, and all are preferably at least one member selected from a derivative of a COOH or carboxylic acid group from the viewpoint of copolymerization.
[164] The derivative of the carboxylic acid group is preferably selected from functional groups, acid halides, and acid amides that protect the COOH group by protecting groups capable of reacting with carboxylic acid esters and acids to be converted into COOH groups.
[165] In the fluorine-containing polymer of the present invention, the structural unit M1 derived from a fluoroolefin is one or more structural units selected from structural units derived from a fluorine-containing ethylenic monomer having 2 or 3 carbon atoms, for example, tetrafluoroethylene, Chlorotrifluoroethylene, vinylidene fluoride, vinyl fluoride, trifluoroethylene, hexafluoropropylene, and the like.
[166] Especially, the structural unit derived from tetrafluoroethylene and chlorotrifluoroethylene is preferable, and it is preferable at the point which can improve transparency and dry etching resistance as a resist use.
[167] The composition ratio of each structural unit in the polymers of the formulas Ma and Mb of the present invention is a structural unit M1; 1 to 99 mol%, structural unit M2a or M2b; 1 to 99 mol%, structural unit N; 0 to 98 mol%, but preferably (M1) + (M2a) = 100 mol%, or (M1) + (M2b) = 100 mol% (M1) / (M2a) or (M1) ) / (M2b) is 80 / 20-20 / 80 mol%, More preferably, it is the ratio of 70 / 30-30 / 70 mol%, More preferably, it is the ratio of 60 / 40-40 / 60 mol%. .
[168] The present inventors have found that in addition to fluoroolefins, monomers capable of forming the monocyclic structures described above, it is possible to copolymerize specific ethylenic monomers having functional groups, thus providing functional groups in fluorine-containing polymers having monocyclic structures in the main chain. Could be introduced.
[169] Various useful functions can also be imparted to the polymer even in photosensitivity and other uses necessary for resist use.
[170] As a structural unit derived from the ethylenic monomer which has a functional group copolymerized with the fluoroolefin and the monomer which forms a monocyclic structure, the structural unit derived from the ethylenic monomer represented by following formula (N-1) is mentioned.
[171]
[172] Wherein X ¹ and X ² are the same or different and both are H or F, X ³ is H, F, CH ₃ or CF ₃ , X ⁴ and X ⁵ are the same or different and both H, F or CF ₃ , Rf is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having an ether bond having 2 to 100 carbon atoms, a is an integer of 0 or 1 to 3, b and c are the same or different Z ² is at least one functional group selected from the group consisting of OH groups, COOH groups, derivatives of carboxylic acid groups, and functional groups protecting OH groups by protecting groups capable of reacting with acids and changing to OH groups. .
[173] For example, the following is illustrated.
[174] ① Structural unit derived from acrylic monomer
[175]
[176] Wherein X ¹ , X ² are the same or different and are all H or F, X ³ is the same or different and all are H, F, Cl, CH ₃ , or CF ₃ , and R is a hydrogen atom, 1 carbon It is selected from a hydrocarbon group of 20 to 20, a fluorine-containing alkyl group of 1 to 20 carbon atoms, a fluorine-containing alkyl group having an ether bond of 2 to 100 carbon atoms, or a fluorine-containing aryl group of 3 to 20 carbon atoms.
[177] -R in the above formula is specifically
[178] Hydrogen atom,
[179]
[180] (Wherein m is an integer of 1 to 5, n is an integer of 1 to 10),
[181]
[182] (m is an integer from 1 to 5, n is an integer from 1 to 10)
[183]
[184] Etc. are mentioned preferably.
[185] Specifically, for example, acrylic acid, methacrylic acid, α-fluoroacrylic acid, α-trifluoromethylacrylic acid, acrylic acid esters, α-fluoroacrylic acid esters, methacrylic acid esters, α-trifluoro In addition to methyl acrylate ester, hydroxyethyl acrylate, hydroxyethyl methacrylate, glycidyl acrylate, glycidyl methacrylate, acrylamide, methacrylamide, etc. are mentioned.
[186] The introduction of structural units derived from these is preferred because it can improve the solubility in solvents, photosensitivity through photoacid generators, adhesion with substrates, compatibility with photoacid generators, and other additives.
[187] Among them, one containing at least one fluorine atom from X ¹ , X ² , X ³ , and / or X ³ is a trifluoromethyl group is preferable in view of transparency and etching resistance, and in particular, X ³ is fluorine It is preferable that it is an atom or a trifluoromethyl group.
[188] ② structural units derived from fluorine-containing ethylenic monomers having functional groups
[189]
[190] (Wherein X ¹ , X ² , X ³ , X ⁴ , a, b, Rf, and Z ² are the same as those of the general formula (N-1)), and among them,
[191]
[192] In the formula, Rf and Z ² are the same as those represented by the general formula (N-1).
[193] More specifically
[194]
[195] In the formula, Z ² is the same as the general formula (N-1), and structural units derived from fluorine-containing ethylenic monomers are preferable. Also, the chemical formula
[196]
[197] The structural units represented by the formula (Rf, Z ² are the same as in the general formula (N-1)) can also be preferably illustrated, more specifically
[198]
[199] In the formula, structural units derived from monomers such as Z ² are the same as in the general formula (N-1).
[200] In addition, as a functional group containing fluorine-containing ethylenic monomer
[201]
[202] (Wherein Rf and Z ² are the same as in the general formula (N-1)) and structural units derived from monomers, and more specifically
[203]
[204] (In formula, Z <^2> is the same as general formula (N-1)).
[205] The functional group Z ² contained in each of the structural units N1 is preferably the same as the example of the functional group Z ¹ described above.
[206] The fluorine-containing polymer containing the structural unit N1 containing the functional group of the present invention is represented by the following general formula Ma-1, and each structural unit of M1, M2a, and N1 is preferably the same as the above-mentioned preferred embodiment.
[207]
[208] In formula, M1 and M2a are the same as said Formula Ma, and structural unit N1 is the same as said Formula N-1.
[209] In addition, the structural unit N1 having a functional group may be further introduced into a fluorine-containing polymer having a functional group in a ring, that is, represented by the following general formula Mb-1, and each structural unit of M1, M2b, N1 is different from the above-mentioned preferred embodiment. The same thing is mentioned preferably. These polymers of the general formula Mb-1 are preferable in that they can introduce more functional groups and can improve the resolution even when used as a resist.
[210]
[211] In the formula, M1 and M2b are the same as the general formula Mb, and the structural unit N1 is the same as the general formula N-1.
[212] The composition ratio of each structural unit in the polymers of the formulas Ma-1 and Mb-1 of the present invention is a structural unit M1; 1 to 98 mol%, structural unit M2a or M2b; 1 to 98 mol%, structural unit N1; 1 to 98 mol%, structural unit N; 0 to 97 mol%, but preferably (M1) + (M2a) + (N1) = 100 mol%, or (M1) + (M2b) + (N1) = 100 mol% M1) + (M2a)} / (N1) or {(M1) + (M2b)} / N1 is a ratio of 99/1 to 20/80 mol%, more preferably 95/5 to 30/70 mol% It is ratio of, More preferably, it is the ratio of 90/10-40/60 mol%.
[213] In the general formulas Ma, Mb, Ma-1, and Mb-1 of the present invention, the structural unit N is an optional component as a structural unit copolymerizable with other structural units.
[214] As what can be used as an arbitrary component, for example
[215] (1) structural units derived from fluorine-containing ethylenic monomers (except M1), for example
[216]
[217] Structural units derived from monomers such as (wherein X is selected from H, F and Cl and m is 2 to 10) are preferably mentioned.
[218] ② structural units derived from ethylenic monomers containing no fluorine
[219] The structural unit derived from the ethylenic monomer which does not contain a fluorine atom may be introduce | transduced in the range which does not deteriorate transparency or dry etching resistance (high refractive index).
[220] This is preferable because the adhesiveness of the substrate can be improved or the solubility in a general purpose solvent can be improved, and the compatibility with, for example, a photoacid generator or an additive to be added as necessary can be improved.
[221] As a specific example of a non-fluorine ethylenic monomer,
[222] α-olefins:
[223] Ethylene, propylene, butene, vinyl chloride, vinylidene chloride, etc.,
[224] Vinyl ether or vinyl ester monomers:
[225] CH ₂ = CHOR, CH ₂ = CHOCOR (R is a hydrocarbon group having 1 to 20 carbon atoms),
[226] Allyl monomers:
[227]
[228] Allyl ether monomer:
[229]
[230] Etc. are illustrated.
[231] Although the molecular weight of the fluorine-containing polymers of the formulas Ma, Mb, Ma-1, and Mb-1 of the present invention can be selected in the range of 500 to 1000000 in terms of number average molecular weight depending on the use, purpose, and use form, preferably 1000 to 700000 More preferably, the molecular weight is about 2000 to 500000, and the molecular weight that is too low tends to be insufficient in heat resistance and mechanical properties of the resulting polymer film, and the molecular weight that is too high tends to be disadvantageous in terms of processability. In particular, in the case of forming a thin film as a form of a coating material, an excessively high molecular weight is disadvantageous in film formability, and therefore it is preferably 300000 or less, particularly preferably 200000 or less.
[232] Any method of obtaining the fluorine-containing polymers of the formulas Ma, Mb, Ma-1, and Mb-1 of the present invention can be used, but for example, each has a fluoroolefin (M1) and a monocyclic structure corresponding to a structural unit. It can be obtained by copolymerizing an unsaturated compound or diene compound (M2) capable of cyclization polymerization, a functional group-containing ethylenic monomer (N1), and a monomer corresponding to an optional component (N) by various known methods. As the polymerization method, a radical polymerization method, an anion polymerization method, a cationic polymerization method, or the like can be used. Among them, each monomer for obtaining the polymer of the present invention has good radical polymerization property, and is easy to control quality such as composition and molecular weight, Since it is easy to industrialize, the radical polymerization method is used preferably.
[233] That is, in order to start the polymerization, the means is not limited at all as long as it proceeds radically, but is initiated by, for example, an organic or inorganic radical polymerization initiator, heat, light or ionizing radiation. As the polymerization mode, solution polymerization, bulk polymerization, suspension polymerization, emulsion polymerization and the like can be used. In addition, molecular weight is controlled by the density | concentration of the monomer used for superposition | polymerization, the density | concentration of a polymerization initiator, the density | concentration of a chain transfer agent, and temperature. The composition of the resulting copolymer can be controlled by the composition of the input monomers.
[234] The second of the present invention relates to a novel aliphatic monocyclic fluorine-containing unsaturated compound having a functional group.
[235] The novel fluorine-containing unsaturated cyclic compound of the present invention is a compound represented by the following formula (1).
[236] <Formula 1>
[237]
[238] Wherein Z ³ is the same or different and both are -Rf ³ -Z ⁴ , wherein Z ⁴ is an OH group by a protecting group that can react with an OH group, a COOH group, a derivative of a carboxylic acid group and an acid to react with the OH group At least one functional group selected from the group consisting of protected functional groups, Rf ³ is a fluorine-containing alkylene group which may have an ether bond having 1 to 30 carbon atoms, and n11 is an integer of 1 to 4.
[239] The compound of the general formula (1) of the present invention is a fluorine-containing unsaturated cyclic compound having a functional group, and the portion Z ³ containing the functional group bonded to the ring structure is characterized by comprising a fluorine-containing alkylene group Rf ³ . Therefore, since copolymerization property with fluoroolefins becomes more favorable and transparency of the obtained fluoropolymer is also excellent, it is preferable.
[240] The functional group Z ⁴ specifically mentions the same as the specific example of the functional group Z ¹ contained in the structural unit of general formula b in the above-mentioned fluorine-containing polymer.
[241] The fluorine-containing alkylene group Rf ³ is preferably
[242]
[243] Etc. are illustrated.
[244] Preferred first of the fluorine-containing unsaturated cyclic compound of the present invention is represented by the following formula (2), and as a specific example Etc. can be mentioned.
[245]
[246] In the formula, Rf ⁴ is an alkylene group, a perfluoroalkyl which may have an ether bond with a carbon number of 1 to 10, R ¹⁴ is a hydrogen atom or an alkyl group having 1 to 10, n11 is the same as the formula (1).
[247] These unsaturated cyclic compounds can be synthesized by any method, but can be synthesized by, for example, the following method.
[248] Firstly, a halide, X ⁴ -Rf ⁴ -COOR ¹⁴ (wherein X ⁴ is selected from bromine or iodine atoms) directly with a metal such as zinc, magnesium or Li, or a Grignard reagent comprising these metals Or an organometallic compound such as an alkyllithium compound is reacted at low temperature to prepare a fluorine-containing alkylating agent X ⁴ MRf ⁴ -COOR ¹⁴ (wherein X ⁴ is bromine or iodine atom and M is metal).
[249] Then, the halide of cyclopentene (Wherein X ⁵ is selected from chlorine, bromine and iodine atoms) by reacting a pre-prepared fluorine-containing alkylating agent X ⁴ MRf ⁴ -COOR ¹⁴ at low temperature with a corresponding carboxylic acid or carboxylic acid derivative-containing fluorine A containing cyclopentene compound can be obtained.
[250] The 2nd preferable 2nd fluorine-containing unsaturated cyclic compound of this invention is a cyclopentene compound which has a fluorine-containing alcohol structure represented by following General formula (3).
[251]
[252] Wherein R ¹⁵ is an alkylene group which may have an ether bond having 1 to 5 carbon atoms or a fluorine-containing alkylene group which may have an ether bond having 1 to 5 carbon atoms, and Rf ⁵ is 1 to 10 carbon atoms which may have an ether bond Is a fluorine-containing alkyl group, Rf ⁶ is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or a fluorine-containing alkyl group having 1 to 10 carbon atoms, which may have an ether bond, n12 is 0 or 1, and n11 is the same as that of the general formula (1).
[253] Especially, the cyclopentene compound which has a fluorine-containing alcohol structure represented by following formula (4) is preferable.
[254]
[255] In the formula, Rf ⁵ , Rf ⁶ are the same as the above formula, n13 is 0 or an integer of 1 to 5, n14 is 0 or 1, n11 is the same as formula (1).
[256] In addition, Rf ⁵ and Rf ⁶ are the same or different, and it is preferable that all of them are perfluoroalkyl groups having 1 to 5 carbon atoms.
[257] These cyclopentene compounds having a fluorine-containing alcohol structure are particularly useful as resists for monomers in that they can impart particularly high transparency to the polymer obtained by copolymerization, and can also impart high acidity of the OH group and solubility in a developer. to be.
[258] As a specific example of the cyclopentene compound which has these fluorine-containing alcohol structures,
[259]
[260] Etc. can be mentioned.
[261] These unsaturated cyclic compounds can be synthesized by any method, but can be synthesized by, for example, the following method.
[262] First, the halide of cyclopentene (Wherein X ⁵ is selected from chlorine, bromine, and iodine atoms) by directly acting on a magnesium metal to synthesize a cyclopentene magnesium halide (Grignard reagent) and reacting it with hexafluoroacetone. .
[263] The third aspect of the present invention is a photoresist composition comprising an aliphatic monocyclic fluorine-containing polymer having an acid reactive group and a photoacid generator, which can be used for patterning process using a F ₂ laser as a light source, preferably a chemically amplified photoresist. It relates to a composition.
[264] The chemically amplified photoresist contains a resin (polymer) component and a photoacid generator, and generates an acid from an acid generator in an energy ray irradiation unit to utilize the catalytic action. In the chemically amplified positive photoresist, the acid generated in the energy ray irradiation unit is diffused by a post heat treatment (hereinafter referred to as "PEB") to leave acid dissociable or acid decomposable functional groups such as resin, and at the same time, The energy ray irradiating portion is alkali-solubilized by regenerating. In addition, chemically amplified negative photoresists generally have a functional group capable of condensation reaction with an acid, are alkali-soluble, and contain a crosslinking agent in addition to this resin component and an acid generator.
[265] The photoresist composition (preferably chemically amplified photoresist composition) of the present invention can correspond to the positive type and the negative type,
[266] (A-1) a fluorine-containing polymer having a group that can be dissociated by an OH group, a COOH group and / or an acid, and changed into an OH group or a COOH group,
[267] (B) photoacid generator, and
[268] (C) A composition comprising a solvent, wherein the fluorine-containing polymer (A-1) has a structural unit derived from a fluoroolefin, and a polymer having a structural unit derived from a monomer forming an aliphatic monocyclic structure in the polymer backbone, preferably Preferably, the polymer having an aliphatic monocyclic structure in the above-mentioned main chain has an OH group, a COOH group as a functional group, and / or a protecting group capable of reacting with an acid to be converted into an OH group or a COOH group. It is a photoresist composition which is a fluoropolymer.
[269] Conventionally, polymers having a monocyclic structure have been considered to have insufficient dry etching resistance when used in resists, but the present inventors have found that sufficient dry etching resistance can be obtained by copolymerizing a fluoroolefin with a structural unit having a monocyclic structure in the main chain. .
[270] The fluorine-containing polymer (A-1) used in the photoresist composition (preferably chemically amplified photoresist composition) of the present invention is a resist in the fluorine-containing polymer having a functional group represented by the formulas Mb and / or Ma-1. It is chosen from having a functional group which acts positively or negatively.
[271] A functional group that acts as a resist is a functional group (-OP) protecting a -OH group by a protecting group (-P) that reacts with an OH group, a COOH group, or an acid, and a group (-OP) that reacts with an acid to be converted into a COOH group ( The functional group (-COO-P) which protected -COOH group by -P) is shown, and 1 or more types are selected from these.
[272] About the specific example of the protected functional group, -O-P, and -COO-P, the thing described in the description part of the functional group in the fluorine-containing polymer mentioned above can be preferably used similarly.
[273] When used in a photoresist composition (preferably a chemically amplified photoresist composition), the content rate of the functional group (the sum of the functional groups in the case of plural uses) in the fluorine-containing polymer varies depending on the type of polymer skeleton and functional group, It is 5-80 mol% with respect to a structural unit, Preferably it is 20-70 mol%, More preferably, it is 30-60 mol%. Too little is not preferable because solubility in a developing solution is insufficient or resolution is insufficient. Too large is not preferable because transparency and dry etching resistance are lowered.
[274] Specific examples of the fluorine-containing polymer (A-1) used in the photoresist composition (preferably chemically amplified photoresist composition) include preferred embodiments of the above-described fluorine-containing polymer (functional group being selected from the above). It can likewise be selected preferably.
[275] As a result of continuous research by the present inventors, it was found that the fluorine-containing polymer having a specific structure in the main chain monocyclic structure having a hydroxyl (OH) group was well dissolved in the alkaline developer used in the developing step of the photoresist process.
[276] It has also been found that the composition of the fluorine-containing polymer itself or the OH group of the fluorine-containing polymer and a photoacid generator is useful as a photoresist composition.
[277] That is, the fourth of the present invention
[278] (A-2) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
[279] (B) photoacid generator, and
[280] (C) A composition containing a solvent, wherein in the repeating unit of the aliphatic monocyclic structure of the fluorine-containing polymer (A-2), when the carbon atom to which the OH group is bonded is a first atom, an agent adjacent to the first carbon atom For the model structure containing up to 4 carbon atoms, the generation enthalpy of the model structure is H (M-OH), the production enthalpy of the model structure from which the OH group is dissociated is H (MO-), and the production enthalpy of hydrogen ions is constant. When set to 200 kJ / mol, the model structure having the OH group satisfies the relationship of the following formula (1), preferably the following formula (2).
[281] <Equation 1>
[282]
[283] <Equation 2>
[284]
[285] In general, the relationship between acidity and alkali solubility is considered to increase alkali solubility as the acidity becomes high, that is, as the acid dissociation constant pKa decreases. However, as long as pKa is small, it does not mean that alkali solubility is high, for example, the solubility of a resist in the developing solution is not prescribed only by pKa of the OH group containing monomer.
[286] However, although the pKa of the OH group of the phenol which is a typical example of an OH group containing hydrocarbon type compound is 10, and the solubility to a developing solution is also favorable, the fluorine-containing obtained by copolymerizing the OH group containing fluorine-containing monomer with pKa about 10 similarly. Some polymers do not dissolve in the developer.
[287] As described above, it was difficult to select a compound having an optimum solubility in a developer with only pKa.
[288] The present inventors approached this problem from a separate viewpoint of generated energy before and after acid dissociation of OH groups, and surprisingly, the OH group-containing fluorine-containing polymer having a repeating unit in the main chain whose ΔH (generation energy difference) defined above satisfies a specific relationship. It was found that the solubility in the developer was excellent. The relation concerning ΔH was first discovered by the inventors.
[289] By the way, although the conventional OH group containing hydrocarbon type compound has a pKa of 12 or more and 14-16, the production energy difference ((DELTA) H) before and after dissociation of the above-mentioned OH group in these hydrocarbon type compounds has sufficient correlation. Does not have
[290] As described above, the inventors of the present invention measured pKa of fluorine-containing compounds having various OH groups, and on the other hand, devised ΔH to examine the relationship with actual pKa. As a result, particularly for OH group-containing fluorine-containing compounds having pKa of 12 or less, The pKa value was found to have a good proportional relationship with ΔH, and ΔH was calculated for the fluorine-containing compound having an OH group according to this relational formula (Equation 1 or 2) to estimate the pKa of the OH group of the fluorine-containing compound. Found that it can.
[291] In addition, focusing on the use as a polymer for resists, high solubility is required for alkaline developing solutions such as 2.38% by weight of tetramethylammonium hydroxide aqueous solution, which are commonly used in the developing process. On the other hand, F2 resist applications require transparency in a vacuum ultraviolet region such as 157 nm, and the use of carboxyl groups or phenolic hydroxyl groups used in conventional resists as developer soluble groups becomes disadvantageous in transparency. Therefore, the selection of the structure of the OH group and its peripheral site | part which has high transparency in a polymer structure and favorable solubility to a developing solution is needed.
[292] Conventionally, the use of a fluorine-containing polymer in which a norbornene skeleton having a -C (CF ₃ ) ₂ OH group is introduced as a developer soluble group is used as a polymer for F2 resists having improved transparency and developer solubility (Patent Publication WO00 / 67072). Etc). However, although the OH group in this fluorine-containing polymer has solubility in a developer by the effect of two CF ₃ groups, The simple introduction of was not sufficient in terms of the dissolution rate of the polymer itself.
[293] The present inventors examined various OH group-containing fluorine-containing monomers and structural units derived therefrom in view of the relationship between ΔH and pKa values, and not only the portion of -C (CF ₃ ) ₂ OH, but also its surrounding structure. The model structure was defined, and the numerical values of these ΔH were calculated and found to have good solubility in the developer when ΔH was below a specific value.
[294] As a result of further investigation on the basis of these new facts, a fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure having an OH group satisfying the relationship of ΔH (Equation 1 or Equation 2) in the polymer main chain or the OH group is protected. It was found that the fluorine-containing polymer having one functional group was excellent in solubility in a developing solution while maintaining excellent transparency as a polymer for resist.
[295] Next, the calculation method of the generation energy difference (DELTA) H before and after dissociation of this invention is demonstrated.
[296] First, an aliphatic monocyclic structural unit having an OH group is selected from the polymer. When the carbon atom to which the OH group is bonded to the aliphatic monocyclic structural unit is regarded as the first atom, the carbon atoms adjacent to the first carbon atom are focused only on the adjacent carbon atoms, and the neighboring carbon atoms of the first carbon atom are the second atoms and the neighbors thereof. The carbon atom is referred to as a third carbon atom, and a structure including a structure up to a fourth carbon atom is selected. When the number of atoms is insufficient on the fourth carbon atom, a structure substituted with a hydrogen atom is used as a model structure. When the number of carbon atoms constituting the aliphatic monocyclic structural unit is small and the fourth carbon atom defined above does not exist, the aliphatic monocyclic structural unit is used as a model structure.
[297] The reason why the structure up to the fourth carbon atom is used as a model structure is that even if the structure of the fifth carbon or more largely separated from the OH group does not significantly affect the numerical value of ΔH, the structure is sufficient when ΔH is compared. In addition, when a model of a large structure is used, a problem arises that it is difficult to obtain sufficient precision with commercially available molecular orbital calculation software.
[298] However, when the technical problem of calculation is solved, (DELTA) H can also be calculated with respect to the whole fluoropolymer containing an aliphatic monocyclic structure, without using a model structure.
[299] For example, structural formula In this case, numbering the carbon atoms In order to form a ring structure with up to the fourth carbon (C ⁴ ), a structure in which hydrogen is bonded to carbon (C ³ , C ⁴ ) lacking the valence number of the structure is employed as a model structure.
[300] Subsequently, molecular orbital calculation is first performed on the adopted model structure to calculate the production enthalpy H (M-OH) before acid dissociation.
[301] Each generation enthalpy is calculated based on the AM1 method, which is a semi-empirical molecular orbital calculation method (described in MJSDewar, EGZoebisch, EFHeary, and JJP Stewart, Journal of American Chemical Society., 107, p3902 (1985)). In the present invention, it was calculated by the MOPAC calculation software manufactured by Fujitsu Co., Ltd., MOPAC97 (molecular orbital calculation software), which is installed in CSChem3D (R) Version 4.0 manufactured by Cambridge Soft Corporation.
[302] With respect to the dissociation of OH groups from the same model structure, the production enthalpy H (M-O-) after acid dissociation is calculated in the same manner as above. The enthalpy of formation of hydrogen ions is set as 200 kJ / mol as a constant.
[303] By these calculations, ΔH of each OH group-containing aliphatic monocyclic structure (model structure) in the fluorine-containing polymer is collectively determined.
[304] Surprisingly, the above formulas (1) and (2) are used for fluorine-containing polymers having structural units derived from OH group-containing fluorine-containing ethylenic monomers in the main chain, and fluorine having structural units derived from fluorine-containing norbornene derivatives in the main chain. The same holds true for the containing polymer.
[305] In the case of a polymer copolymerized with a fluorine-containing ethylenic monomer having an OH group, the model structure is determined by the following method.
[306] When a carbon atom bonded to an OH group is referred to as a first atom, only a neighboring carbon atom is taken into consideration, and a neighboring carbon atom is referred to as a second atom, and the neighboring carbon atom is referred to as a third atom, and a structure up to the third or fourth carbon atom is shown. When the structure containing was selected and the valence number is insufficient on the 3rd or 4th carbon atom, the structure substituted by the hydrogen atom was made into the model structure.
[307] The reason why the structure up to a 4th carbon atom was made into a model structure is the same as the above. When the technical problem of a calculation is solved, it is also the same as above that ΔH can be calculated with respect to the whole fluorine-containing ethylenic monomer, without using a model structure. However, when the number of fluorine atoms in the structure increases, the accuracy of the MOPAC calculation (to be described later) is deteriorated. Therefore, when the number of fluorine atoms becomes seven or more in the model structure up to the fourth carbon, the structure up to the third carbon is calculated as the model structure. It is desirable to.
[308] For example, in the case of the OH group-containing fluorine-containing ethylenic monomer of the structural formula CH ₂ = CHCH ₂ C (CF ₃ ) ₂ OH, the carbon atom is numbered C ⁴ H ₂ = C ³ HC ² H ₂ C ¹ (C ² F ₃ ) ₂ OH, and since the fourth carbon atom (C ⁴ ) having 6 or less fluorine atoms can be employed in the calculation, CH ₂ = CHCH ₂ C (CF ₃ ) ₂ OH of the entire molecule is calculated. Adopt.
[309] In addition, the following fluorine-containing ethylenic monomer In the case of the case of employing up to the fourth carbon atom (C ⁴ ), since the number of fluorine atoms is 7 or more, the model structure up to the third carbon atom (C ³ ), namely The model structure of is employed in the calculation for the structural unit derived from the OH group-containing fluorine-containing ethylenic monomer.
[310] Next, in the case of the fluorine-containing polymer having a structural unit derived from the fluorine-containing norbornene derivative in the main chain, the model structure is basically selected in the same definition as in the case of the aliphatic monocyclic structural unit.
[311] For example, In the case of employing up to the fourth carbon atom, the model structure of the structural unit derived from the fluorine-containing norbornene derivative Becomes A structure in which hydrogen is bonded to carbon (C ⁴ ) having a low valence of the above structure can be employed as a model structure.
[312] However, even in this case, when the technical problem of calculation is solved due to the low fluorine substitution rate, ΔH may be calculated for the entire structural unit derived from the fluorine-containing norbornene derivative.
[313] The fluorine-containing polymer (A-2) in the photoresist composition of the present invention contains a structural unit having ΔH of 75 kJ / mol or less calculated by the above-described aliphatic monocyclic structure (model structure) having an OH group, and containing fluorine. It is preferred as a photoresist having high solubility in an aqueous solution of 2.38% by weight of tetramethylammonium hydroxide (developing solution), which was considered difficult to dissolve, and excellent in transparency.
[314] Further, ΔH is preferably 70 kJ / mol or less, and more preferably 50 kJ / mol or less. When ΔH is too large, solubility in a developer of a polymer obtained by polymerization thereof is insufficient, sufficient resolution cannot be obtained when forming a resist pattern, fine patterns cannot be obtained, and residues or residues tend to remain. The lower limit of ΔH is -110 kJ / mol, preferably -65 kJ / mol or more, and more preferably -40 kJ / mol or more.
[315] The fifth photoresist composition of the present invention
[316] (A-3) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
[317] (B) photoacid generator, and
[318] The composition containing (C) solvent is related with the photoresist composition characterized by the repeating unit of the aliphatic monocyclic structure of a fluorine-containing polymer (A-3) containing the structure represented by following formula (50).
[319] <Formula 50>
[320]
[321] In the formula, Rf ¹¹ is a perfluoroalkyl group having 1 to 20 carbon atoms, and Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[322] The fluorine-containing polymer (A-3) comprising the structure of formula (50) is a developer of the resist by the effect of the group Z ¹⁰ bonded on the carbon atom adjacent to the carbon atom bonded to Rf ¹¹ in addition to Rf ¹¹ . It is preferable as a polymer for resist because it shows better solubility with respect to 2.38 weight% of tetramethylammonium hydroxide aqueous solution widely used.
[323] Rf ¹¹ in the structure of Formula 50 is a perfluoroalkyl group, specifically
[324] Among these, CF ₃ , C ₂ F ₅ , C ₃ F ₇ , C ₄ F ₉ , (CF ₃ ) ₂ CF and the like can be cited as preferred specific examples.
[325] Z ¹⁰ in the structure of Formula 50 is selected from a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms. Perfluoro be preferably the same as illustrated in the examples of the alkyl group, and examples of Rf ^11, among them there may be mentioned as particularly preferred for _{F, CF 3, C 2 F} 5.
[326] In addition, the structure of Formula 50 may exist in the form of a side chain on the aliphatic monocyclic structure constituting the fluorine-containing polymer (A-3), or as part of a ring structure forming an aliphatic monocyclic structure. In addition, although it is preferable that 1 or more OH groups exist in 1 molecule of monocyclic structures, 2 or more OH groups may exist.
[327] As a structure represented by general formula (50) among the repeating units of the aliphatic monocyclic structure of a fluoropolymer (A-3), the structure represented by following general formula (51) is mentioned preferably.
[328]
[329] In the formula, Rf ¹¹ and Rf ¹² are the same or different and are a perfluoroalkyl group having 1 to 20 carbon atoms, and Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[330] In the structure of Chemical Formula 51, Rf ¹² may be the same as Rf ¹¹ described above as preferred embodiments. Rf ¹¹ and Rf ¹² may be the same or different.
[331] In addition, the structure of Formula 51 may exist in the form of a side chain on the aliphatic monocyclic structure constituting the fluorine-containing polymer (A-3), or as part of a ring structure forming an aliphatic monocyclic structure. Although one or more OH groups are preferably present in one molecule of monocyclic structure, two or more OH groups may be present.
[332] As a structure represented by General formula (50) among the repeating unit of the aliphatic monocyclic structure of a fluoropolymer (A-3), the structure represented by following General formula (52) is also mentioned as a preferable example.
[333]
[334] In the formulas, Rf ¹¹ is a perfluoroalkyl group having 1 to 20 carbon atoms, Z ^10, Z ¹¹ are the same or different, is a fluorine atom or a perfluoroalkyl group of 1 to 20 carbon atoms.
[335] In the structure of Chemical Formula 52, Z ¹¹ may be the same as Z ¹⁰ described above as a preferred embodiment, and Z ¹⁰ and Z ¹¹ may be the same or different.
[336] The structure of formula 52 may be present in the form of a side chain on the aliphatic monocyclic structure constituting the fluorine-containing polymer (A-3), or as part of a ring structure forming an aliphatic monocyclic structure. Although one or more OH groups are preferably present in one molecule of monocyclic structure, two or more OH groups may be present.
[337] In the fluorine-containing polymer including the structure of Formula 50 to Formula 52, the above-mentioned ΔH may be more than 75 kJ / mol, but also includes many of 75 kJ / mol or less, and of course, ΔH is 75 kJ / mol or less, Furthermore, it is preferable that it is 70 kJ / mol or less, especially 50 kJ / mol or less.
[338] As a preferable specific structure of the aliphatic monocyclic structural repeating unit contained in the fluorine-containing polymer used for the photoresist composition of this invention, the structural unit represented by following formula (53), or the structural unit represented by following formula (54) is mentioned. The fluorine-containing polymer including each structural unit represented by the formulas (53) and (54) is called (A-5).
[339] <Formula 53>
[340]
[341] Wherein Rf ⁵⁰ , Rf ⁵¹ are the same or different and are perfluoroalkyl groups of 1 to 20 carbon atoms, X ¹⁰ , X ¹¹ are the same or different, and H, F, 1 to 20 carbon atoms, preferably An alkyl group having 1 to 5 carbon atoms or a fluorine-containing alkyl group which may include an ether bond having 1 to 20 carbon atoms, preferably 1 to 5 carbon atoms, X ¹² is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms, or 1 carbon atom. A fluorine-containing alkyl group, an OH group, or a Wherein Rf ⁵² and Rf ⁵³ are the same or different and are all perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵⁰ is an alkylene group having 1 to 3 carbon atoms to form a ring, or At least one selected from a fluorine-containing alkylene group, R ⁵¹ and R ⁵² are the same or different and have a divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or an oxygen atom to form a ring; A divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, a divalent fluorine-containing alkylene group having 1 to 7 carbon atoms forming a ring, or a sum of an oxygen atom and a carbon atom forming a ring is 2 At least one selected from a divalent fluorine-containing alkylene group containing an ether bond having from 7 to 7, provided that the sum of carbon atoms forming the main chain of R ⁵¹ and R ⁵² is 7 or less, and OH is any of the carbon atoms in R ⁵¹ Flag It has the formula (Wherein Rf ⁵² and Rf ⁵³ are the same as the above), a group represented by the above may be bonded, and R ⁵⁰ is at least one selected from an alkylene group having 1 to 3 carbon atoms or a fluorine-containing alkylene group forming a ring; R ⁵¹ and R ⁵² are the same or different and a divalent hydrocarbon group having 1 to 7 carbon atoms to form a ring, an oxygen atom or an ether having a total of 2 to 7 carbon atoms and an oxygen atom to form a ring A divalent hydrocarbon group containing a bond, a divalent fluorine-containing alkylene group having 1 to 7 carbon atoms to form a ring, or a divalent containing ether bond having a total of 2 to 7 oxygen atoms and a carbon atom to form a ring At least one selected from a fluorine-containing alkylene group, provided that the sum of carbon atoms forming the main chain of R ⁵¹ and R ⁵² is 7 or less, R ⁵³ , R ⁵⁴ are the same or different, and a divalent having 1 or 2 carbon atoms; Alkylene group or Is a divalent alkylene group having 1 or 2 containing fluorine, n50, n51, n52, n53, n54 are the same or different, are all 0 or 1.
[342] <Formula 54>
[343]
[344] ^{Wherein, Rf 50, X 10, X} 11, R 50, R 51, R 52, R 53, R 54, n50, n51, n52, n53, n54 are as defined in the general formula 53.
[345] In addition, it is preferable to include the structure of any of the above-mentioned general formula (50), 51, 52 among each structural unit represented by these general formula (53), (54).
[346] Specifically, X ¹² in Formula 53 is preferably Z ¹⁰ in Formula 51, wherein Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[347] At least one Z ¹⁰ in the formula 50 (wherein Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms) on one of the neighboring carbon atoms of the carbon atom to which the OH group in formula 54 is bonded Z ¹⁰ , Z ¹¹ in Formula 52 (wherein Z ¹⁰ , Z ¹¹ are the same or different fluorine atoms, or on both neighboring carbon atoms of the carbon atom to which the OH group in Formula 54 is bonded, or a bond, or It is preferable that one or more carbon atoms of 1 to 20 carbon atoms are bonded to each other.
[348] These fluorine-containing polymers having a repeating unit having a monocyclic structure represented by the formulas (53) and (54) are novel materials not described in the conventional literature or patents, and the preferred ones described above in the formulas (53) and (54) are likewise disclosed in the conventional literature or patents. It is a substance.
[349] More specifically, the followings are mentioned, and (DELTA) H by a calculation is also shown about the one part.
[350]
[351]
[352] In addition, during the aliphatic monocyclic structure having an OH in a photoresist composition of the present invention may be a portion having an OH group or an OH bond two or more, for example, in place of X ¹² from the monocyclic structure shown by the formula 53 In which Rf ⁵² , Rf ⁵³ are the same or different and all are a perfluoroalkyl group having 1 to 20 carbon atoms, and / or carbon of any one of R ⁵¹ (when n51 is 1) On the atom There may be mentioned a (In the formula, Rf ^52, Rf ⁵³ is the same also as defined above), preferably to the combined one or more of them. Further, in the structure in that the OH group is bonded in the monocyclic structure represented by formula 54 in which the carbon atoms of R ⁵¹ (if n51 is 1) and (or) R ⁵¹ (if n51 is 1) Preferably it has one or more structural units of (in the formula, Rf ⁵² is the same also as defined above).
[353]
[354]
[355] Etc. can be illustrated and it is preferable that it is a fluorine-containing polymer which has these structural units. Moreover, the fluorine-containing polymer which has a repeating unit of these illustrated monocyclic structures is also a novel substance not described in the conventional literature or patent.
[356] Out of these Monomers capable of forming structural units It is also a novel compound and what was shown to the following synthesis process (1) as a specific synthesis example is mentioned.
[357] Synthesis Process (1)
[358]
[359] Also, Monomers capable of forming structural units It is also a novel substance, The following synthesis process (2) is mentioned as a specific synthesis example.
[360] Synthesis Process (2)
[361]
[362] Also, Monomers capable of forming structural units It is also a novel substance, The following synthesis | combination process (3) is mentioned as a specific synthesis example.
[363] Synthesis Process (3)
[364]
[365] (MEC-31 is a fluorinating agent manufactured by Daikin Kogyo Co., Ltd.)
[366] Also, Monomers capable of forming structural units Is a novel substance, and the following synthesis process (4) is mentioned as a specific synthesis example.
[367] Synthesis Process (4)
[368]
[369] (MEC-11 is a fluorinating agent manufactured by Daikin Kogyo Co., Ltd.)
[370] Also, Formation of structural units of It can obtain by cyclization polymerization of the diene compound of this.
[371] In addition, new monomers It can also be obtained by (co) polymerization, and the following synthesis process (5) is mentioned as a specific synthesis example.
[372] Synthesis Process (5)
[373]
[374] or
[375]
[376] The fluorine-containing polymer having an OH group in the photoresist composition of the present invention may be an aliphatic monocyclic structure that satisfies Equation 1 above, an aliphatic monocyclic structure including a structure of Formulas 50 to 52, or a monocyclic structure of Formulas 53 to 54 ( It is preferable to have one or more of the above-mentioned "structure unit M3", and it is the homopolymer which consists only of the structural unit M3 of the monocyclic structure which has these OH groups, or the structural unit copolymerizable with these structural units M3 (M1 mentioned above). , N, etc.), and is represented by the following general formula (60), and has a number average molecular weight of 500 to 1000000 containing 0.1 to 100 mol% of structural unit M3 and 0 to 99.9 mol% of structural unit N3. It is preferable that it is a containing polymer.
[377] -(M3)-(N3)-
[378] Wherein M3 is a repeating unit of an aliphatic monocyclic structure that satisfies Equation 1 or 2 above, and is selected from an aliphatic monocyclic structure including a structure of Formulas 50 to 52, and a monocyclic structure of Formulas 53 to 54 N3 is a structural unit derived from the monomer copolymerizable with structural unit M3.
[379] In particular, the fluorine-containing polymer containing a repeating unit selected from the monocyclic structures of the formulas (53) and (54) is a novel substance not described in the literature and patent specification.
[380] That is, the novel fluorine-containing polymer of the present invention is represented by the following general formula (61), and has a number average molecular weight of 500 to 0.1 to 100 mol% of structural unit M3-1 and 0 to 99.1 mol% of structural unit N3-1. 1000000 is a fluorine-containing polymer.
[381] <Formula 61>
[382]
[383] In the formula, M3-1 is one or more structural units selected from the monocyclic structural units of formula 53 or 54, and N3-1 is a structural unit derived from a monomer copolymerizable with structural unit M3-1.
[384] Specifically, the structural unit M3-1 in the fluorine-containing polymer of the present invention is preferably the same as that described above as the specific examples of the general formulas (53) and (54).
[385] In the general formulas (60) and (61), the copolymerization component N3 or N3-1 is an optional component and is not particularly limited as long as it is a monomer copolymerizable with the structural unit M3 or M3-1, and is appropriately selected depending on the required properties of the target fluorine-containing polymer. It is desirable to.
[386] Among them, N3 or N3-1 is preferably the structural unit M1 (the ethylenic monomer having 2 or 3 carbon atoms, the structural unit derived from a monomer having one or more fluorine atoms) in the novel fluorine-containing polymer (Ma) described above. The same thing as the preferable example of the structural unit M1 mentioned above is mentioned preferably. These structural units can obtain a polymer having excellent transparency and dry etching resistance, and are therefore suitable as a polymer for photoresist.
[387] Examples of the structural unit N3 include the same specific examples as the structural units of the structural units N and N1 described in the first (fluorine-containing polymer having an aliphatic monocyclic structure in the main chain) of the present invention. For example, the specific example of N1 can be mentioned similarly.
[388] In the fluorine-containing polymer (fluorine-containing polymer used in the photoresist composition) of the present invention, the combination of the structural unit M3 or M3-1 and the structural unit N3 or N3-1, and the composition ratio are intended for the purpose and physical properties from the above examples. (Especially glass transition point, hardness, etc.), a function (transparency, refractive index), etc. can be selected in various ways.
[389] One of the fluorine-containing polymers (fluorine-containing polymer used in the photoresist composition) of the present invention contains the structural unit M3 or M3-1 as an essential component, and can introduce OH groups and fluorine atoms onto the cyclic structural unit. Therefore, the structural unit M3 or M3-1 itself maintains a low refractive index to impart transparency, a solvent solubility of hydroxyl groups, an aqueous alkali solution (developer) solubility, substrate adhesion, crosslinkability, and the like. It has the characteristic of being combined. Moreover, since it is a cyclic structural unit, dry etching resistance also becomes favorable. Therefore, the fluorine-containing polymer of the present invention maintains transparency and dry etching resistance even in a composition containing a large amount of structural units M3 or M3-1, and extremely polymers containing only structural units M3 or M3-1 (100 mol%). Can be.
[390] In addition, in the case of the copolymer including the structural unit N3 or N3-1 of the monomer copolymerizable with the structural unit M3 or M3-1 of the present invention, the glass transition point is high by selecting the structural unit N3 or N3-1 from the above examples. Or a fluorine-containing polymer having high transparency (particularly a vacuum ultraviolet region) and high dry etching resistance.
[391] In the copolymer of the structural unit M3 or M3-1 and the structural unit N3 or N3-1, the content ratio of the structural unit M3 or M3-1 is preferably 0.1 mol% or more based on all monomers constituting the fluorine-containing polymer. . In order to give alkali solution (developer) solubility to a fluoropolymer, the content rate of structural unit M3 or M3-1 is 10 mol% or more, Preferably it is 20 mol% or more, Furthermore, it is preferable to contain 30 mol% or more. An upper limit is 100 mol% (or less).
[392] The fluorine-containing polymer (fluorine-containing polymer used in the photoresist composition) of the present invention is particularly preferable in resist applications because the transparency and dry etching resistance do not decrease even when the ratio of the structural unit M3 or M3-1 is increased.
[393] In addition, when transparency, such as said use, is required, it is preferable that the combination of structural unit M3 or M3-1 and structural unit N3 or N3-1 is a fluorine-containing polymer which has the combination and composition which can become amorphous.
[394] Although the molecular weight of the fluorine-containing polymer (fluorine-containing polymer used for a photoresist composition) of this invention can be selected from the range whose number average molecular weight is 500-1 million, for example, Preferably it is 1000-50000, Especially preferably, 2000 To 200000.
[395] When the molecular weight is too low, the mechanical properties tend to be insufficient, and the strength of the resist film tends to be insufficient. When molecular weight is too high, solvent solubility will worsen, especially film formation property or leveling property will fall easily at the time of thin film formation. Most preferably as a coating use, it is selected in the range whose number average molecular weights are 5000-100000.
[396] The transparency is preferably transparent in a vacuum ultraviolet region having a wavelength of 200 nm or less, for example, an absorption coefficient of 157 nm is 3.0 μm ⁻¹ or less, preferably 2.0 μm ⁻¹ or less, particularly preferably 1.0 μm ⁻¹ or less. These fluorine-containing polymers are preferable as the base polymer for the F2 resist.
[397] In addition, the fluorine-containing polymer is preferably soluble in a general purpose solvent, and is soluble in at least one of, for example, a ketone solvent, an acetate ester solvent, an alcohol solvent, an aromatic solvent, a glycol ether solvent, and a glycol ester solvent. It is preferable that it is or is soluble in the mixed solvent containing 1 or more types of said general-purpose solvents.
[398] The fluorine-containing polymer (fluorine-containing polymer for use in the photoresist composition) of the present invention is obtained by homopolymerizing an unsaturated compound containing a monomer capable of forming a structural unit M3 or M3-1, for example, an aliphatic monocyclic structure having an OH group. Or a monomer capable of forming a structural unit M3 or M3-1 by a cyclization (co) polymerization of an ethylenic diene monomer having an OH group and a monomer which becomes a copolymerization component as a structural unit N3 or N3-1 in a known method. It can be obtained by (co) polymerization. As the polymerization method, a radical polymerization method, an anion polymerization method, a cation polymerization method, or the like can be used. Above all, the monomers exemplified in order to obtain the OH group-containing fluorine-containing polymer of the present invention preferably have a radical polymerization property, are easy to control the quality of the composition, molecular weight and the like, and are easy to industrialize. do.
[399] In order to initiate radical polymerization, the means is not limited at all as long as it proceeds radically, but is initiated by, for example, an organic or inorganic radical polymerization initiator, heat, light, or ionizing radiation. As the polymerization mode, solution polymerization, bulk polymerization, suspension polymerization, emulsion polymerization and the like can be used. In addition, molecular weight is controlled by the density | concentration of the monomer used for superposition | polymerization, the density | concentration of a polymerization initiator, the density | concentration of a chain transfer agent, temperature, etc. The copolymer composition can be controlled by the monomer composition of the charged monomer.
[400] Moreover, it may be protected by the protecting group which changes a part or all OH group of the fluorine-containing polymer used for the photoresist composition of this invention by changing with an acid by making it react with an acid. Accordingly, the protecting group can be changed to the OH group by the acid generated from the photoacid generator to act as a positive resist.
[401] That is, the present invention provides (A-4) a fluorine-containing polymer having a functional group protected by the OH group by a protecting group capable of reacting an OH group with an acid to change the OH group of the OH group-containing fluorine-containing polymer,
[402] (B) photoacid generator, and
[403] (C) A composition containing a solvent, wherein the fluorine-containing polymer (A-4) is an aliphatic monocyclic ring of any one of the fluorine-containing polymers (A-2), (A-3) and (A-5). It also relates to a photoresist composition which is a fluorine-containing polymer having a functional group protected by the protecting group with the OH group contained in the repeating unit of the structure.
[404] As an example of the acid dissociable group used as a protecting group
[405]
[406] In the formula, groups represented by R1, R2, R3 and R4 are the same or different and all are alkyl groups having 1 to 5 carbon atoms.
[407] More specifically,
[408]
[409] Can be preferably exemplified, and among them, acid reactivity is good. Is preferable, and -OC (CH ₃ ) ₃ , -OCH ₂ OCH ₃ , and -OCH ₂ OC ₂ H ₅ are preferable in view of good transparency.
[410] The fluorine-containing polymer having only OH groups can be used as a negative resist in combination with a crosslinking agent known per se.
[411] In addition, when used as a positive resist, the OH group can coexist with a functional group which is changed into a COOH group by the action of another acid dissociable group, for example, an acid, so that the solubility and dissolution rate in the developer can be adjusted, and the resolution can be improved. .
[412] Moreover, it is also preferable at the point which can improve adhesiveness with a base material by introduction of the OH group and COOH group in a fluoropolymer.
[413] In the photoresist composition (preferably chemically amplified photoresist composition) of the present invention, the photoacid generator (B) is a compound which generates an acid or a cation by irradiating the material itself or a resist composition containing the material with radiation. to be. It can also be used as a mixture of 2 or more types.
[414] As a photo-acid generator (B), well-known compounds, such as an organic halogen compound, a sulfonic acid ester, an onium salt, a diazonium salt, a disulfone compound, and a mixture thereof are mentioned, for example.
[415] Specifically, for example, tris (trichloromethyl) -s-triazine, tris (tribromomethyl) -s-triazine, tris (dibromomethyl) -s-triazine, 2,4-bis Haloalkyl group-containing s-triazine derivatives such as (tribromomethyl) -6-p-methoxyphenyl-s-triazine, 1,2,3,4-tetrabromobutane, 1,1,2,2 Halogen-substituted paraffinic hydrocarbons such as tetrabromoethane, carbon tetrabromide and iodoform, halogen-substituted cycloparaffinic hydrocarbons such as hexabromocyclohexane, hexachlorocyclohexane and hexabromocyclododecane, bis Haloalkyl group-containing sulfone compounds such as haloalkyl group-containing benzene derivatives such as (trichloromethyl) benzene and bis (tribromomethyl) benzene, tribromomethylphenyl sulfone, and trichloromethylphenyl sulfone, and 2,3-dibromo sulfolane Halogen-containing sulfolane compounds such as tris (2,3-dibromopropyl) isocyanurate Haloalkyl group-containing isocyanurates, triphenylsulfonium chloride, triphenylsulfonium methanesulfonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium tetra Sulfonium salts such as fluoroborate, triphenylsulfonium hexafluoroarsenate, triphenylsulfonium hexafluorophosphonate, diphenyliodonium trifluoromethanesulfonate, diphenyliodonium p-toluene Iodonium salts such as sulfonate, diphenyliodonium tetrafluoroborate, diphenyliodonium hexafluoroarsenate, diphenyliodonium hexafluorophosphonate, methyl p-toluenesulfonic acid, p- Ethyl toluenesulfonic acid, butyl p-toluenesulfonic acid, phenyl p-toluenesulfonic acid, 1,2,3-tris (p-toluenesulfonyloxy) benzene, p-toluenesulfonic acid benzoin ester, methyl methanesulfonic acid, Ethyl tansulfonate, butyl methanesulfonic acid, 1,2,3-tris (methanesulfonyloxy) benzene, methanesulfonic acid phenyl, methanesulfonic acid benzoin ester, trifluoromethanesulfonic acid methyl, trifluoromethanesulfonic acid ethyl, trifluoro Sulfonic acid esters such as butyl methanesulfonate, 1,2,3-tris (trifluoromethanesulfonyloxy) benzene, phenyl trifluoromethanesulfonic acid, and benzoin esters of trifluoromethanesulfonic acid, and disulfides such as diphenyldisulfone Phons, bis (phenylsulfonyl) diazomethane, bis (2,4-dimethylphenylsulfonyl) diazomethane, bis (cyclohexylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-methoxyphenylsul Ponyl) diazomethane, cyclohexylsulfonyl- (3-methoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-methoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2- Methoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-methoxyphenylsulfonyl) dia Zomethane, cyclopentylsulfonyl- (4-methoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-fluorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-fluorophenyl Sulfonyl) diazomethane, cyclohexylsulfonyl- (4-fluorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2-fluorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3 -Fluorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (4-fluorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-chlorophenylsulfonyl) diazomethane, cyclohexylsulfonyl -(3-chlorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-chlorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2-chlorophenylsulfonyl) diazomethane, cyclopentylsul Ponyl- (3-chlorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (4-chlorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-trifluoromethylphenylsulphur Phenyl) diazomethane, cyclohexylsulfonyl- (3-trifluoromethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-trifluoromethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl-( 2-trifluoromethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-trifluoromethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (4-trifluoromethylphenylsulfonyl) diazomethane , Cyclohexylsulfonyl- (2-trifluoromethoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-trifluoromethoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-tri Fluoromethoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2-trifluoromethoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-trifluoromethoxyphenylsulfonyl) diazomethane , Cyclopentylsulfonyl- (4-trifluoromethoxyphenylsulfonyl) diazomethane, cyclohexylsulfo -(2,4,6-trimethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2,3,4-trimethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2,4,6- Triethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2,3,4-triethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2,4,6-trimethylphenylsulfonyl) dia Zomethane, cyclopentylsulfonyl- (2,3,4-trimethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2,4,6-triethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl -(2,3,4-triethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2-methoxyphenylsulfonyl) diazomethane, phenylsulfonyl- (3-methoxyphenylsulfonyl) diazo Methane, phenylsulfonyl- (4-methoxyphenylsulfonyl) diazomethane, bis (2-methoxyphenylsulfonyl) diazomethane, bis (3-methoxyphenylsulfonyl) diazomethane, bis (4 -Methoxyphenylsulfonyl) diazomethane, phenylsulfonyl- (2,4,6-trimethylphenylsulfonyl) diazomethane, pe Nylsulfonyl- (2,3,4-trimethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2,4,6-triethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2,3,4 -Triethylphenylsulfonyl) diazomethane, 2,4-dimethylphenylsulfonyl- (2,4,6-trimethylphenylsulfonyl) diazomethane, 2,4-dimethylphenylsulfonyl- (2,3, 4-trimethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2-fluorophenylsulfonyl) diazomethane, phenylsulfonyl- (3-fluorophenylsulfonyl) diazomethane, phenylsulfonyl- ( Sulfondiazides such as 4-fluorophenylsulfonyl) diazomethane, o-nitrobenzyl esters such as o-nitrobenzyl-p-toluenesulfonate, and N, N'-di (phenylsulfonyl) hydrazide And sulfone hydrazides.
[416] As the photoacid generator, a compound in which the generated acid is any one of sulfonic acid, sulfenic acid, and sulfinic acid is preferable. Specifically, sulfonates of onium such as triphenylsulfonium p-toluenesulfonate and diphenyliodonium p-toluenesulfonate, phenyl p-toluenesulfonate, 1,2,3-tris (p-toluenesulfonyloxy Sulfonic acid esters such as benzene, disulfones such as diphenyl disulfone, bis (phenylsulfonyl) diazomethane, bis (2,4-dimethylphenylsulfonyl) diazomethane and bis (cyclohexylsulfonyl) dia Zomethane, cyclohexylsulfonyl- (2-methoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-methoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-methoxyphenyl Sulfonyl) diazomethane, cyclopentylsulfonyl- (2-methoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-methoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (4 -Methoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-fluorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-fluorophenylsulfonyl) dia Methane, cyclohexylsulfonyl- (4-fluorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2-fluorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-fluorophenylsul Ponyl) diazomethane, cyclopentylsulfonyl- (4-fluorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-chlorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-chloro Phenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-chlorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2-chlorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3- Chlorophenylsulfonyl) diazomethane, cyclopentylsulfonyl- (4-chlorophenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2-trifluoromethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-trifluoromethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4-trifluoromethylphenylsulfonyl) diazomethane, cyclopentylsulfo -(2-trifluoromethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-trifluoromethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (4-trifluoromethylphenylsulfonyl) dia Zomethane, cyclohexylsulfonyl- (2-trifluoromethoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (3-trifluoromethoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (4 -Trifluoromethoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2-trifluoromethoxyphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (3-trifluoromethoxyphenylsulfonyl) dia Zomethane, cyclopentylsulfonyl- (4-trifluoromethoxyphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2,4,6-trimethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- ( 2,3,4-trimethylphenylsulfonyl) diazomethane, cyclohexylsulfonyl- (2,4,6-triethylphenylsulfonyl) diazomethane, cyclo Hexylsulfonyl- (2,3,4-triethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2,4,6-trimethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2, 3,4-trimethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2,4,6-triethylphenylsulfonyl) diazomethane, cyclopentylsulfonyl- (2,3,4-triethylphenyl Sulfonyl) diazomethane, phenylsulfonyl- (2-methoxyphenylsulfonyl) diazomethane, phenylsulfonyl- (3-methoxyphenylsulfonyl) diazomethane, phenylsulfonyl- (4-methoxy Phenylsulfonyl) diazomethane, bis (2-methoxyphenylsulfonyl) diazomethane, bis (3-methoxyphenylsulfonyl) diazomethane, bis (4-methoxyphenylsulfonyl) diazomethane, Phenylsulfonyl- (2,4,6-trimethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2,3,4-trimethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2,4,6 -Triethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2,3,4-triethylphenylsulfonyl) diazomethane, 2,4-dimethylphene Nylsulfonyl- (2,4,6-trimethylphenylsulfonyl) diazomethane, 2,4-dimethylphenylsulfonyl- (2,3,4-trimethylphenylsulfonyl) diazomethane, phenylsulfonyl- (2 Sulfondiazides such as -fluorophenylsulfonyl) diazomethane, phenylsulfonyl- (3-fluorophenylsulfonyl) diazomethane and phenylsulfonyl- (4-fluorophenylsulfonyl) diazomethane and o-nitrobenzyl esters such as o-nitrobenzyl-p-toluenesulfonate, and the like, and sulfonazides are particularly preferable.
[417] In addition to the above examples, onium salt type photoacid generators containing fluorine atoms can also be used, for example, (Wherein, A ¹ is an element selected from iodine, sulfur, selenium, tellurium, nitrogen or phosphorus, in the case of A ¹ is iodine, the R ^2-1 and R ^3-1 is absent, R ^1-1 is An alkyl group having 1 to 15 carbon atoms or an aryl group having 6 to 15 carbon atoms, and when A ¹ is sulfur, selenium or tellurium, R ^3-1 does not exist, and R ^1-1 and R ^2-1 are each independently carbon atoms; An alkyl group of 1 to 15 carbon atoms, an aryl group of 6 to 20 carbon atoms, a dialkylamino group of 2 to 30 carbon atoms, an alkylarylamino group of 7 to 35 carbon atoms, or a diarylamino group of 12 to 40 carbon atoms, and R ^1-1 and R ^{2- 1} may be bonded to each other to form a ring, and when A ¹ is nitrogen or phosphorus, R ^1-1 , R ^2-1 and R ^3-1 each independently represent an alkyl group having 1 to 15 carbon atoms, and have 6 to 20 carbon atoms. An aryl group, a dialkylamino group having 2 to 30 carbon atoms, an alkylarylamino group having 7 to 35 carbon atoms, or a 12 to 40 carbon atom It is a diarylamino group, R ^1-1 and R ^2-1 and R ^3-1 may be bonded to each other to form one or more rings, or R ^3-1 is absent, R ^1-1 and R ^2-1 may combine to form an aromatic ring including A ¹ , provided that the alkyl group, the alkyl group of the dialkylamino group and the alkyl group of the alkylarylamino group are aryl group, halogen atom, oxygen atom, nitrogen atom, sulfur atom or The aryl group, the aryl group of the alkylarylamino group and the aryl group of the diarylamino group may be substituted with a silicon atom, branched, or form a ring, and an aryl group of an alkyl group, haloalkyl group, halogen atom, alkoxyl group, aryloxy group, nitro group, May be substituted with an amide group, cyano group, alkanoyl group, alloyl group, alkoxycarbonyl group, aryloxycarbonyl group or acyloxy group, R ^f is branched or a C 1 to C 15 perfluoroalkyl group or Will the perfluoroalkyl portion of the hydrogen fluoride of the alkyl group is substituted, X ^- is Brent's five fluoroalkyl represented by TED being conjugated base of the acid) salts) or ( (Wherein A ² and A ³ are the same or different and are all selected from iodine, sulfur, selenium, tellurium, nitrogen or phosphorus, if A ² or A ³ is iodine R ^4-1 , R ^{5 -1} , R ^7-1 and R ^8-1 are absent, and when A ² or A ³ is sulfur, selenium or tellurium, R ^5-1 and R ^8-1 are absent, R ^4-1 and R ^7-1 are each independently an alkyl group having 1 to 15 carbon atoms, an aryl group having 6 to 20 carbon atoms, a dialkylamino group having 2 to 30 carbon atoms, an alkylarylamino group having 7 to 35 carbon atoms or a diarylamino group having 12 to 40 carbon atoms, When A ² or A ³ is nitrogen or phosphorus, R ^4-1 , R ^5-1 , R ^7-1 and R ^8-1 each independently represent an alkyl group having 1 to 15 carbon atoms, an aryl group having 6 to 20 carbon atoms, and carbon atoms of 2 to 30, and di-alkyl amino group, a diarylamino group having a carbon number of 7 to 35 carbon atoms or an alkylaryl group of 12 to 40, R ^4-1 and R ^5-1, Is R ^7-1 and R ^8-1 are each itdoe may combine with each other to form a ring, provided that the alkyl group, the alkyl group of the alkyl group and an alkyl aryl group of the dialkylamino group is an aryl group, a halogen atom, an oxygen atom, a nitrogen atom, The aryl group, the aryl group of the alkylarylamino group and the aryl group of the diarylamino group may be substituted with a sulfur atom or a silicon atom, branched, or form a ring, and an aryl group of an alkyl group, a haloalkyl group, a halogen atom, an alkoxyl group, an aryloxy group, It may be substituted by nitro group, amide group, cyano group, alkanoyl group, alloyl group, alkoxycarbonyl group, aryloxycarbonyl group or acyloxy group, R ^6-1 is aryl group, halogen atom, oxygen atom, nitrogen atom, sulfur atom Or an alkylene group having 1 to 15 carbon atoms which may be substituted, branched, or form a ring with a silicon atom, and Rf is a branch having 1 to 15 carbon atoms which may be branched or may form a ring; Will some of the fluorine in the alkyl group Rd to a group or a perfluoroalkyl group is substituted with hydrogen, X ^- may be preferably an alkyl onium salt type, such as fluoro being represented by the conjugate base) of Brent's Ted acid.
[418] Specific examples include the following fluoroalkyl onium salts.
[419] Fluoroalkyl-onium salts whose central element is iodine:
[420]
[421] Fluoroalkyl-onium salts whose central element is sulfur:
[422]
[423]
[424]
[425]
[426]
[427]
[428] Fluoroalkyl-onium salts whose central element is selenium:
[429]
[430] Fluoroalkyl-onium salts with central element tellurium:
[431]
[432] Fluoroalkyl-onium salts whose central element is nitrogen:
[433]
[434] Fluoroalkyl-onium salts with the central element phosphorus:
[435]
[436]
[437] X ^- in these exemplified fluoroalkylonium salts is the conjugate base of Brenstead acid. As the blended acid, fluoro such as trifluoromethanesulfonic acid, tetrafluoroethanesulfonic acid, perfluorobutanesulfonic acid, perfluoropentanesulfonic acid, perfluorohexanesulfonic acid, perfluorooctanesulfonic acid, difluoromethanesulfonic acid and the like In addition to alkylsulfonic acids, methanesulfonic acid, trichloromethanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, sulfuric acid, fluorosulfonic acid, chlorosulfonic acid, HBF4, HSbF6, HPF6, HSbCl5F, HSbCl6, HAsF6, HBCl3F, HAlCl4, etc. It is not limited. In particular, fluoroalkylsulfonic acid is preferable because it is a strong acid and does not generate hydrogen fluoride or hydrogen chloride.
[438] The onium salts having these fluorine-containing alkyl groups are preferred in that they have high transparency in the vacuum ultraviolet region, and are compatible with the fluorine-containing polymer having an acid reactive group in the chemically amplified photoresist composition of the present invention. It is preferable at the point which is favorable.
[439] The content of the photoacid generator in the photoresist composition (chemically amplified photoresist composition) of the present invention is preferably 0.1 to 30 parts by weight, more preferably 0.2 to 20 parts by weight, based on 100 parts by weight of the fluorine-containing polymer having an acid reactive group. , 0.5 to 10 parts by weight is most preferred.
[440] If the content of the photoacid generator is less than 0.1 part by weight, the sensitivity is lowered. If the content of the photoacid generator is used more than 30 parts by weight, the amount of light absorbed by the photoacid generator is increased, so that the light does not reach the substrate sufficiently and the resolution is easily deteriorated. .
[441] The photoresist composition of the present invention may also be added an organic base which can act as a base to the acid generated from the photoacid generator.
[442] The purpose of the addition of the organic base is to prevent the acid generated from the photoacid generator from the exposure to the PEB, thereby causing the resist pattern to cause dimensional variation. Therefore, the compound that can neutralize the acid generated from the photoacid generator as described above is not particularly limited. However, when the inorganic compound is used as the base, a small amount of residue is formed after the formation of the pattern and the resist is removed, which adversely affects the organic base. Is preferred. The organic base is an organic amine compound selected from nitrogen-containing compounds, specifically, pyrimidine, 2-aminopyrimidine, 4-aminopyrimidine, 5-aminopyrimidine, 2,4-diaminopyrimidine, 2, 5-diaminopyrimidine, 4,5-diaminopyrimidine, 4,6-diaminopyrimidine, 2,4,5-triaminopyrimidine, 2,4,6-triaminopyrimidine, 4,5 , 6-triaminopyrimidine, 2,4,5,6-tetraaminopyrimidine, 2-hydroxypyrimidine, 4-hydroxypyrimidine, 5-hydroxypyrimidine, 2,4-dihydroxypyri Midine, 2,5-dihydroxypyrimidine, 4,5-dihydroxypyrimidine, 4,6-dihydroxypyrimidine, 2,4,5-trihydroxypyrimidine, 2,4,6- Trihydroxypyrimidine, 4,5,6-trihydroxypyrimidine, 2,4,5,6-tetrahydroxypyrimidine, 2-amino-4-hydroxypyrimidine, 2-amino-5-hydride Roxypyrimidine, 2-amino-4,5-dihydroxypyrimidine, 2-amino-4,6-dihydroxypy Limidine, 4-amino-2,5-dihydroxypyrimidine, 4-amino-2,6-dihydroxypyrimidine, 2-amino-4-methylpyrimidine, 2-amino-5-methylpyrimidine , 2-amino-4,5-dimethylpyrimidine, 2-amino-4,6-dimethylpyrimidine, 4-amino-2,5-dimethylpyrimidine, 4-amino-2,6-dimethylpyrimidine, 2 -Amino-4-methoxypyrimidine, 2-amino-5-methoxypyrimidine, 2-amino-4,5-dimethoxypyrimidine, 2-amino-4,6-dimethoxypyrimidine, 4 -Amino-2,5-dimethoxypyrimidine, 4-amino-2,6-dimethoxypyrimidine, 2-hydroxy-4-methylpyrimidine, 2-hydroxy-5-methylpyrimidine, 2 -Hydroxy-4,5-dimethylpyrimidine, 2-hydroxy-4,6-dimethylpyrimidine, 4-hydroxy-2,5-dimethylpyrimidine, 4-hydroxy-2,6-dimethylpyrimidine , 2-hydroxy-4-methoxypyrimidine, 2-hydroxy-4-methoxypyrimidine, 2-hydroxy-5-methoxypyrimidine, 2-hydroxy-4,5-dimethoxypyrimid Dean, 2-hydroxy-4,6-dimeth Pyrimidine compounds such as cipyrimidine, 4-hydroxy-2,5-dimethoxypyrimidine, 4-hydroxy-2,6-dimethoxypyrimidine, pyridine, 4-dimethylaminopyridine, 2, Pyridine compounds such as 6-dimethylpyridine, diethanolamine, triethanolamine, triisopropanolamine, tris (hydroxymethyl) aminomethane, bis (2-hydroxyethyl) iminotris (hydroxymethyl) methane and the like Amino phenols, such as amine substituted by 1 or more and 4 or less hydroxyalkyl group, 2-aminophenol, 3-aminophenol, 4-aminophenol, etc. are mentioned. As the organic base, pyrimidines, pyridines or amines having a hydroxy group are preferable, and amines having a hydroxy group are particularly preferable. These may be used independently and may mix and use 2 or more types. 0.1-100 mol% is preferable with respect to content of a photo-acid generator, and, as for content of the organic base in the photoresist composition of this invention, 1-50 mol% is more preferable. When it is less than 0.1 mol%, resolution is low, and when it is more than 100 mol%, there exists a tendency to become a reduction degree.
[443] In addition, in the photoresist composition (chemically amplified photoresist composition) of the present invention, when using a fluorine-containing polymer to form a negative resist composition, a crosslinking agent may be used as necessary as described above.
[444] It does not restrict | limit especially as a crosslinking agent to be used, It can select arbitrarily and can use from the thing conventionally used as a crosslinking agent of a negative resist.
[445] For example, N-methylolated melamine, N-alkoxymethylolated melamine compounds, urea compounds, epoxy compounds, isocyanate compounds and the like are preferred embodiments.
[446] These may be used independently and may be used in combination of 2 or more type. Especially, it is advantageous to use combining the said melamine resin and urea resin.
[447] The content ratio of the crosslinking agent in the photoresist (particularly negative type) composition of the present invention is 3 to 70 parts by weight, preferably 5 to 50 parts by weight, more preferably 10 to 40 parts by weight, based on 100 parts by weight of the fluorine-containing polymer. Is selected from the range. If it is less than 3 weight part, a resist pattern is hard to form, and when it exceeds 70 weight part, since light transmittance falls and resolution is easy to fall, or developability falls, it is unpreferable.
[448] The photoresist composition of the present invention may further contain various additives commonly used in this field, such as a dissolution inhibitor, a sensitizer, a dye, an adhesion improving agent, and a water retention agent, as necessary. Although the presence of water is essential for generating an acid with a chemically amplified resist, an acid can be effectively generated by the presence of a small amount of a repair agent such as polypropylene glycol.
[449] When using these additives, these amounts are about 20 weight% in total with respect to the total solid weight in a composition.
[450] In the photoresist composition (chemically amplified photoresist composition) of the present invention, the solvent (C) is capable of dissolving the fluorine-containing polymer, the photoacid generator (B), and various additives exemplified above, and has good paintability (surface smoothness). And uniformity of film thickness) can be used without particular limitation.
[451] Preferred solvents (C) include, for example, cellosolve solvents such as methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, diethyl oxalate, ethyl pyruvate, ethyl-2- Hydroxybutylate, ethyl acetoacetate, butyl acetate, amyl acetate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 2-hydroxyisobutyrate, 2 Ester solvents such as ethyl hydroxyisobutyrate, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate Propylene glycol systems such as dipropylene glycol dimethyl ether Ketone solvents, such as a medium, 2-hexanone, cyclohexanone, methylamino ketone, and 2-heptanone, aromatic hydrocarbons, such as toluene, xylene, chlorobenzene, and chlorotoluene, or these 2 or more types of mixed solvent, etc. are mentioned. Can be.
[452] Moreover, you may use a fluorine-type solvent as needed in order to improve the solubility of a fluoropolymer.
[453] For example, CH ₃ CCl ₂ F (HCFC-141b), CF ₃ CF ₂ CHCl ₂ / CClF ₂ CF ₂ CHClF mixture (HCFC-225), perfluorohexane, perfluoro (2-butyltetrahydrofuran) , Methoxy-nonafluorobutane, 1,3-bistrifluoromethylbenzene, etc.
[454]
[455] Fluorine alcohols such as benzotrifluoride, perfluorobenzene, perfluoro (tributylamine), ClCF ₂ CFClCF ₂ CFCl ₂ and the like.
[456] These fluorine-based solvents may be used alone or as a solvent in which two or more kinds of fluorine-based solvents or non-fluorine-based and fluorine-based compounds are mixed.
[457] Although the quantity of these solvents (C) is selected according to the kind of solid content to melt | dissolve, the base material to apply | coat, target film thickness, etc., from the viewpoint of ease of application | coating, the total solid content concentration of a resist composition is 0.5 to 70 weight%, Preferably it is 1 It is preferable to use so that it may become 50 to 50 weight%, especially 5 to 30 weight%.
[458] As a method of using the photoresist composition (chemically amplified resist composition) of the present invention, a resist pattern forming method of a conventional photoresist technique is used. However, in order to perform preferably, first, a solution of the resist composition on a support such as a silicon wafer is used. It is applied with a spinner or the like and dried to form a photosensitive layer, which is irradiated with ultraviolet rays, deep-UV light, excimer laser light, and X-rays through a desired mask pattern by a reduced projection exposure apparatus or the like, or by electron beams. Draw and heat. This is then developed using a developing solution, for example, an alkaline aqueous solution such as 1 to 10% by weight of an aqueous tetramethylammonium hydroxide solution. By this forming method, an image faithful to the mask pattern can be obtained.
[459] Among them, it was found that by using the photoresist composition (chemically amplified resist composition) of the present invention, a resist film (photosensitive layer) having high transparency can be formed even in a vacuum ultraviolet region. Accordingly, the present invention can be suitably used in photolithography processes using an F ₂ laser (157 nm wavelength), which is being developed, aiming at a technology node of 0.1 m in the future.
[460] 10th of this invention is OH group containing fluorine-containing cyclopentene represented by following formula (70), and can provide a polymer with a repeating unit of monocyclic structure.
[461] <Formula 70>
[462]
[463] Wherein, Rf ⁷⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷⁰ is a perfluoroalkyl group of the fluorine atom or having 1 to 20 carbon atoms, X ⁷¹ is a hydrogen atom, a fluorine atom, a C 1 -C 20 hydrocarbon group Or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷² is a hydrogen atom, a fluorine atom, an OH group, a hydrocarbon group having 1 to 20 carbon atoms or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷³ is a hydrogen atom, fluorine An atom, a hydrocarbon group of 1 to 20 carbon atoms, or a perfluoroalkyl group of 1 to 20 carbon atoms, provided that when X ⁷² is an OH group, X ⁷³ is not a fluorine atom.
[464] This novel monocyclic monomer has high copolymerizability with fluoroolefins as described above, and thus can easily introduce OH groups into the polymer, solubility in developer and other functions (for example, transparency in vacuum ultraviolet region). Can be given to the polymer. Moreover, since a monocyclic structural unit can be formed in a polymer main chain, glass transition temperature can be raised and it is also preferable from a dry etching tolerance point.
[465] In particular, in Formula 70, X ⁷¹ and X ⁷² are both a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷³ is an OH group, and X ⁷⁴ is a perfluoroalkyl group having 1 to 20 carbon atoms. It is preferable at the point which can give a polymer the outstanding solubility of solution and transparency.
[466] As a specific example of the novel OH group-containing fluorine-containing cyclopentene of the present invention, for example,
[467] Etc. are mentioned preferably.
[468] In addition, the monomer which is these novel cyclopentene derivatives can be synthesize | combined by the method as described in the synthesis process (1)-(4) mentioned above.
[469] Moreover, these monomers can also be homopolymerized by the use of a radical polymerization initiator or a cationic polymerization initiator by itself. In addition, radical polymerization with the above-mentioned various fluoroolefins (monomers providing structural unit M1), acrylic monomers, and alpha -olefins is possible, and the polymer can be provided with hydrophilicity, developer solubility, transparency, and various other functions.
[20] It is a first object of the present invention to provide a novel fluorine-containing polymer having an aliphatic monocyclic structure in its main chain.
[21] A second object of the present invention is to provide a novel aliphatic monocyclic fluorine-containing unsaturated compound having a functional group.
[22] A third object of the present invention is to provide a chemically amplified photoresist composition comprising an aliphatic monocyclic fluorine-containing polymer having an acid reactive group and a photoacid generator, which can be used in a patterning step using a F ₂ laser as a light source.
[23] MEANS TO SOLVE THE PROBLEM As a result of earnestly researching in order to achieve such an objective, the present inventors discovered a novel aliphatic monocyclic fluorine-containing unsaturated compound and the novel fluorine-containing polymer which has an aliphatic monocyclic structure in a principal chain, and this fluorine-containing polymer is a polymer for resists. It was found to be useful as.
[24] That is, the present inventors examined various copolymers of fluoroolefins represented by tetrafluoroethylene and hydrocarbon monocyclic unsaturated compounds, and as a result, specific hydrocarbon monocyclic unsaturated compounds capable of constituting rings in the main chain have 2 carbon atoms. It was found that the copolymerizability with the fluoroolefins of 3 to 3 was good, and a new fluorine-containing polymer was found.
[25] The first of the present invention relates to a novel fluorine-containing polymer. This first novel fluorine-containing polymer is a polymer having an aliphatic monocyclic structure in the polymer main chain represented by the following formula (Ma), which contains 1 to 99 mol% of structural unit M1, 1 to 99 mol% of structural unit M2a, and structural unit N It is a fluorine-containing polymer whose number average molecular weight contains 500-1 million containing 0-98 mol%.
[26]
[27] In the formula, the structural unit M1 is an ethylenic monomer having 2 or 3 carbon atoms, which is a structural unit derived from a monomer having one or more fluorine atoms, and the structural unit M2a forms an aliphatic monocyclic structure in the polymer main chain represented by the following formula (a). The structural unit N is a structural unit derived from monomers copolymerizable with the structural units M1 and M2a.
[28]
[29] Wherein R ¹ represents a hydrocarbon group (but may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) forming a divalent ring having 1 to 8 carbon atoms, and an ether bond having 2 to 8 carbon atoms in total At least one hydrocarbon group selected from the group consisting of a hydrocarbon group (but may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) having a divalent ring, and R ² has 1 to 3 carbon atoms to form a ring Phosphorus alkylene group, R ³ and R ⁴ are the same or different, and are both divalent alkylene groups having 1 or 2 carbon atoms, n1, n2, n3 are the same or different and all are 0 or 1.
[30] The second of the first fluorine-containing polymer of the present invention is a polymer having an aliphatic monocyclic structure in the polymer main chain represented by the following general formula (Mb), 1 to 99 mol% of structural unit M1, 1 to 99 mol% of structural unit M2b, and structure The number average molecular weight containing unit N containing 0-98 mol% is related with the fluorine-containing polymer of 500-1 million.
[31]
[32] In the formula, the structural unit M1 and the structural unit N are the same as the general formula Ma, and the structural unit M2b is at least one structural unit which forms an aliphatic monocyclic structure in the main chain represented by the following general formula b.
[33]
[34] Wherein, R ¹ , R ² , R ³ , R ⁴ , n1, n2, n3 are the same as the above formula a, and Z is the same or different and all (Wherein Z ¹ is at least one functional group selected from the group consisting of functional groups protecting OH groups by protecting groups capable of reacting with OH groups, COOH groups, derivatives of carboxylic acid groups and acids and changing to OH groups, and R ⁵ is Divalent organic group, n5 is 0 or 1), and n4 is an integer of 1-3.
[35] The second of the present invention relates to a fluorine-containing unsaturated cyclic compound represented by the following general formula (1).
[36]
[37] Wherein Z ³ is the same or different and both are -Rf ³ -Z ⁴ , wherein Z ⁴ is an OH group by a protecting group that can react with an OH group, a COOH group, a derivative of a carboxylic acid group and an acid to react with the OH group At least one functional group selected from the group consisting of protected functional groups, Rf ³ is a fluorine-containing alkylene group which may have an ether bond having 1 to 30 carbon atoms, and n11 is an integer of 1 to 4.
[38] Third of the present invention
[39] (A-1) a fluorine-containing polymer having a group that is dissociated by an OH group, a COOH group and / or an acid, and can be changed into an OH group or a COOH group,
[40] (B) photoacid generator, and
[41] (C) The composition containing a solvent, The said fluorine-containing polymer (A-1) is a photoresist which is a polymer which has a structural unit derived from the fluoroolefin and the monomer which forms the aliphatic monocyclic structure in the polymer main chain. To a composition.
[42] Fourth of the present invention
[43] (A-2) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
[44] (B) photoacid generator, and
[45] (C) A composition containing a solvent, wherein in the repeating unit of the aliphatic monocyclic structure of the fluorine-containing polymer (A-2), when the carbon atom to which the OH group is bonded is a first atom, an agent adjacent to the first carbon atom For a model structure containing up to 4 carbon atoms, the generation enthalpy of the model structure is H (M-OH), the production enthalpy of the model structure in which the OH group is dissociated is H (MO-), and the production enthalpy of hydrogen ions is constant. When set to 200 kJ / mol, the model structure having the OH group relates to a photoresist composition characterized in that it satisfies the relationship of Equation 1 below.
[46]
[47]
[48] In addition, the fifth aspect of the present invention
[49] (A-3) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a moiety having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
[50] (B) photoacid generator, and
[51] The composition containing (C) solvent is related with the photoresist composition characterized by the repeating unit of the aliphatic monocyclic structure of a fluorine-containing polymer (A-3) containing the structure represented by following formula (50).
[52]
[53] In the formula, Rf ¹¹ is a perfluoroalkyl group having 1 to 20 carbon atoms, and Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[54] The OH groups in the repeating units of these aliphatic monocyclic structures may be protected with a protecting group.
[55] The sixth aspect of the present invention
[56] (A-5) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
[57] (B) photoacid generator, and
[58] (C) The composition containing a solvent, Comprising: The said fluoropolymer (A-5) relates to the photoresist composition which is a polymer which has a structural unit represented by following formula (53).
[59]
[60] Wherein Rf ⁵⁰ , Rf ⁵¹ are the same or different and are perfluoroalkyl groups having 1 to 20 carbon atoms, X ¹⁰ , X ¹¹ are the same or different and are H, F, alkyl groups having 1 to 20 carbon atoms or carbon atoms A fluorine-containing alkyl group which may include an ether bond of 1 to 20, X ¹² is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms, a fluorine-containing alkyl group which may include an ether group having 1 to 20 carbon atoms, an OH group or Chemical formula Wherein Rf ⁵² and Rf ⁵³ are the same or different and are all perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵⁰ is an alkylene group having 1 to 3 carbon atoms to form a ring, or At least one selected from a fluorine-containing alkylene group, R ⁵¹ and R ⁵² are the same or different and have a divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or an oxygen atom to form a ring; A divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, a divalent fluorine-containing alkylene group having 1 to 7 carbon atoms forming a ring, or a sum of an oxygen atom and a carbon atom forming a ring is 2 At least one selected from a divalent fluorine-containing alkylene group containing an ether bond having from 7 to 7, provided that the sum of carbon atoms forming the main chain of R ⁵¹ and R ⁵² is 7 or less, and OH is any of the carbon atoms in R ⁵¹ Flag It has the formula Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same as the above, R ⁵³ and R ⁵⁴ may be the same or different, and a divalent alkylene group having 1 or 2 carbon atoms or a 1 or 2 carbon atom. It is a bivalent fluorine-containing alkylene group, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[61] Seventh of the present invention
[62] (A-5) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
[63] (B) photoacid generator, and
[64] (C) The composition containing a solvent, Comprising: The said fluoropolymer (A-5) relates to the photoresist composition which is a polymer which has a structural unit represented by following formula (54).
[65]
[66] Wherein Rf ⁵⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ¹⁰ , X ¹¹ are the same or different and may comprise H, F, an alkyl group having 1 to 20 carbon atoms or an ether bond having 1 to 20 carbon atoms. May be a fluorine-containing alkyl group, R ⁵⁰ is at least one selected from an alkylene group having 1 to 3 carbon atoms or a fluorine-containing alkylene group forming a ring, and R ⁵¹ and R ⁵² are the same or different; A divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or a divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, and a carbon atom forming a ring At least one selected from a divalent fluorine-containing alkylene group having 1 to 7 or a divalent fluorine-containing alkylene group having an ether bond having a total of 2 to 7 carbon atoms and an oxygen atom forming a ring, provided that R ⁵¹ and And the sum of carbon number lower than 7 to form the main chain of the R ^52, also OH group) or (in which the carbon atom in R ⁵¹ Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same or different and all are perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵³ and R ⁵⁴ are the same or different and have 1 carbon atom. Or a divalent alkylene group of 2 or a divalent fluorine-containing alkylene group having 1 or 2 carbon atoms, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[67] X ¹² in Formula 53 is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms, or a fluorine atom at one or more of carbon atoms positioned next to a carbon atom bonded to an OH group in R ⁵¹ or R ⁵² of Formula 54; Or it is preferable to include the structural unit which one or more C1-C20 perfluoroalkyl group couple | bonded.
[68] In addition, in the structure of R ⁵¹ in Formula 54 It is also preferable structural unit having one or more of the structural unit represented by (wherein, Rf ⁵² is the same also as defined above).
[69] Eighth of the present invention is represented by the following formula 61, a fluorine-containing polymer having a number average molecular weight of 500 to 1000000, containing 0.1 to 100 mol% of structural unit M3-1, 0 to 99.9 mol% of structural unit N3-1 It is about.
[70]
[71] In the formula, M3-1 is a structural unit represented by the following formula (53), and N3-1 is a structural unit derived from a monomer copolymerizable with structural unit M3-1.
[72] <Formula 53>
[73]
[74] Wherein Rf ⁵⁰ and Rf ⁵¹ are the same or different and are perfluoroalkyl groups having 1 to 20 carbon atoms, X ¹⁰ and X ¹¹ are the same or different and are H, F, alkyl groups having 1 to 20 carbon atoms or carbon atoms. A fluorine-containing alkyl group which may include an ether bond of 1 to 20, X ¹² is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms, a fluorine-containing alkyl group which may include an ether group having 1 to 20 carbon atoms, an OH group or Chemical formula (Wherein Rf ⁵² , Rf ⁵³ are the same or different and are all perfluoroalkyl groups having 1 to 20 carbon atoms), R ⁵⁰ is an alkylene group having 1 to 3 carbon atoms to form a ring, or At least one selected from a fluorine-containing alkylene group, R ⁵¹ and R ⁵² are the same or different and have a divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or an oxygen atom to form a ring; A divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, a divalent fluorine-containing alkylene group having 1 to 7 carbon atoms forming a ring, or a sum of an oxygen atom and a carbon atom forming a ring is 2 At least one selected from a divalent fluorine-containing alkylene group containing an ether bond having from 7 to 7, provided that the sum of carbon atoms forming the main chain of R ⁵¹ and R ⁵² is 7 or less, and OH is any of the carbon atoms in R ⁵¹ Flag It has the formula Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same as the above, R ⁵³ and R ⁵⁴ may be the same or different, and a divalent alkylene group having 1 or 2 carbon atoms or a 1 or 2 carbon atom. It is a bivalent fluorine-containing alkylene group, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[75] In addition, the ninth of the present invention is represented by the following formula 61, a fluorine having a number average molecular weight of 500 to 1000000, containing 0.1 to 100 mol% of the structural unit M3-1, 0 to 99.9 mol% of the structural unit N3-1 It relates to a containing polymer.
[76] <Formula 61>
[77]
[78] In the formula, M3-1 is a structural unit represented by the following formula (54), and N3-1 is a structural unit derived from a monomer copolymerizable with the structural unit M3-1.
[79] <Formula 54>
[80]
[81] Wherein Rf ⁵⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ¹⁰ , X ¹¹ are the same or different and may comprise H, F, an alkyl group having 1 to 20 carbon atoms or an ether bond having 1 to 20 carbon atoms. May be a fluorine-containing alkyl group, R ⁵⁰ is at least one selected from an alkylene group having 1 to 3 carbon atoms or a fluorine-containing alkylene group forming a ring, and R ⁵¹ and R ⁵² are the same or different; A divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or a divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, and a carbon atom forming a ring At least one selected from a divalent fluorine-containing alkylene group having 1 to 7 or a divalent fluorine-containing alkylene group having an ether bond having a total of 2 to 7 carbon atoms and an oxygen atom forming a ring, provided that R ⁵¹ and And the sum of carbon number lower than 7 to form the main chain of the R ^52, also OH group) or (in which the carbon atom in R ⁵¹ Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same or different and all are perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵³ and R ⁵⁴ are the same or different and have 1 carbon atom. Or a divalent alkylene group of 2 or a divalent fluorine-containing alkylene group having 1 or 2 carbon atoms, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[82] X ¹² in Formula 53 is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms, or a fluorine atom at any one of carbon atoms positioned next to a carbon atom bonded to an OH group in R ⁵¹ or R ⁵² of Formula 54; Or a structural unit having one or more perfluoroalkyl groups having 1 to 20 carbon atoms bonded thereto.
[83] In addition, in the structure of R ⁵¹ in Formula 54 It is preferable to have one or more structural units represented by (where Rf ⁵² is the same as above).
[84] In addition, it is preferable that the structural unit M3-1 is a structural unit that satisfies Equation 1 and further Equation 2.
[85] A tenth aspect of the present invention relates to an OH group-containing fluorine-containing cyclopentene represented by the following general formula (70).
[86]
[87] Wherein, Rf ⁷⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷⁰ is a perfluoroalkyl group of the fluorine atom or having 1 to 20 carbon atoms, X ⁷¹ is a hydrogen atom, a fluorine atom, a C 1 -C 20 hydrocarbon group Or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷² is a hydrogen atom, a fluorine atom, an OH group, a hydrocarbon group having 1 to 20 carbon atoms or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷³ is a hydrogen atom, fluorine An atom, a hydrocarbon group of 1 to 20 carbon atoms, or a perfluoroalkyl group of 1 to 20 carbon atoms, provided that when X ⁷² is an OH group, X ⁷³ is not a fluorine atom.
[88] In Formula 70, X ⁷¹ and X ⁷² may be both a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷³ is an OH group, and X ⁷⁴ is a perfluoroalkyl group having 1 to 20 carbon atoms.
[470] Next, although this invention is demonstrated based on an Example, this invention is not limited only to this Example.
[471] Example 1 (Synthesis of Copolymer of Cyclopentene and Tetrafluoroethylene)
[472] Cyclopentene in 100 ml autoclave 3.4 g, 40 ml of HCFC-141b and 0.3 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) were added thereto, and the system was sufficiently replaced with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 10.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.78 MPaG (8.0 kgf / cm ² G) to 0.75 MPaG (7.7 kgf / cm ² G) before the reaction.
[473] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with hexane to separate the copolymer. It vacuum-dried until it became a fixed amount and obtained 1.5 g of copolymers. ^From the analysis results of ¹ H-NMR and ¹⁹ F-NMR, the structure is represented by the formula Was to be displayed.
[474] The composition ratio of this copolymer was the copolymer whose TFE / cyclopentene is 50/50 mol% by elemental analysis. The number average molecular weight was 5700 by GPC analysis.
[475] Example 2 Synthesis of Copolymer of 2,3-Dihydrofuran and Tetrafluoroethylene
[476] 2,3-dihydrofuran instead of cyclopentene The reaction was carried out in the same manner as in Example 1 except that 3.5 g was used.
[477] As the reaction proceeded, the gauge pressure dropped from 0.78 MPaG (8.0 kgf / cm ² G) to 0.75 MPaG (7.7 kgf / cm ² G) before the reaction.
[478] After removing the unreacted monomer, the polymer was isolated in the same manner as in Example 1 to obtain 2.1 g of a copolymer. ^From the analysis results of ¹ H-NMR and ¹⁹ F-NMR, the structure is represented by the formula Was to be displayed.
[479] The composition ratio of this copolymer was the copolymer whose TFE / 2,3-dihydrofuran is 50/50 mol% by elemental analysis. The number average molecular weight was 17000 by GPC analysis.
[480] Example 3 (Synthesis of Copolymer of Cyclooctene and Tetrafluoroethylene)
[481] Cyclooctene in 100 ml autoclave 2.8 g, 40 ml of HCFC-141b and 0.4 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) were added, and the system was sufficiently replaced with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 10.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.88 MPaG (9.0 kgf / cm ² G) to 0.84 MPaG (8.6 kgf / cm ² G) before the reaction.
[482] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with methanol to separate the copolymer. It vacuum-dried until it became a fixed amount and obtained 2.7 g of copolymers. ^The structure is represented by ¹ H-NMR analysis Was to be displayed.
[483] The composition ratio of this copolymer was the copolymer whose TFE / cyclooctene is 52/48 mol% from the result of elemental analysis. The number average molecular weight was 9900 by GPC analysis.
[484] Example 4 Synthesis of Copolymer of 3,3'-Dimethylcyclopropene and Tetrafluoroethylene
[485] 3,3'-dimethylcyclopropene in 300 ml autoclave 4.0 g, 140 ml of HCFC-141b and 0.8 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) were added thereto, and the system was sufficiently replaced with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 23.5 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.80 MPaG (8.2 kgf / cm ² G) to 0.65 MPaG (6.6 kgf / cm ² G) before the reaction.
[486] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with methanol to separate the copolymer. It was vacuum-dried until it became a fixed amount and 1.7 g of copolymers were obtained. ^The structure is represented by ¹ H-NMR analysis Was to be displayed.
[487] The composition ratio of this copolymer was the copolymer whose TFE / 3,3'- dimethylcyclopropene is 61/39 mol% from the result of elemental analysis.
[488] Example 5 Synthesis of Copolymer of Dicyclopentene and Tetrafluoroethylene
[489] Dicyclopentene in 100 ml autoclave 3.4 g, HCFC-141b40 ml, and 0.4 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) were added thereto, and the system was sufficiently replaced with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 10.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.90 MPaG (9.2 kgf / cm ² G) to 0.88 MPaG (9.0 kgf / cm ² G) before the reaction.
[490] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with methanol to separate the copolymer. It vacuum-dried until it became a fixed amount and 1.0 g of copolymers were obtained.
[491] ^It confirmed that it was a polymer of the following structure by <^1> H-NMR analysis, and absorption of the carbon-carbon double bond was observed by IR analysis.
[492]
[493] The composition ratio of this copolymer was the copolymer whose TFE / dicyclopentene is 51/49 mol% from the result of elemental analysis. In addition, absorption of carbon-carbon double bonds was observed by IR analysis. The number average molecular weight was 3800 by GPC analysis.
[494] Example 6 (Synthesis of Copolymer of 2,3-Dihydrofuran with Tetrafluoroethylene and tert-Butyl-αfluoroacrylate)
[495] 7.0 g of 2,3-dihydrofuran, 5.8 g of tert-butyl-α fluoroacrylate, 40 ml of HCFC-141b, bis (4-tert-butylcyclohexyl) peroxydicarbonate (500 ml of autoclave) TCP) 0.8g was added, and the inside of system was fully substituted with nitrogen gas, cooling by dry ice / methanol liquid. Subsequently, 40.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.88 MPaG (9.0 kgf / cm ² G) to 0.86 MPaG (8.8 kgf / cm ² G) before the reaction.
[496] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with hexane to separate the copolymer. It vacuum-dried until it became a fixed amount and obtained 11.2 g of copolymers.
[497] The composition ratio of this copolymer was 23/33/44 mol% of TFE / 2,3-dihydrofuran / tert-butyl- alpha fluoroacrylate from the analysis results of ¹ H-NMR and ¹⁹ F-NMR. . The number average molecular weight was 18000 by GPC analysis.
[498] Example 7 Synthesis of Copolymer of Cyclopentene, Tetrafluoroethylene, and tert-Butyl-αfluoroacrylate
[499] In a 100 ml autoclave, 3.4 g of cyclopentene, 1.5 g of tert-butyl-αfluoroacrylate, 40 ml of HCFC-141b, and 0.3 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) The system was sufficiently substituted with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 10.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.78 MPaG (8.0 kgf / cm ² G) to 0.77 MPaG (7.9 kgf / cm ² G) before the reaction.
[500] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with hexane to separate the copolymer. It dried under vacuum until it became a fixed amount and obtained 2.2 g of copolymers.
[501] The composition ratio of the copolymer was a copolymer with ¹ H-NMR and ¹⁹ F-NMR From the analysis results of the TFE / cyclopentene / tert- butyl -α acrylate fluoro 15.1 / 39.3 / 45.6% by mole. The number average molecular weight was 12000 by GPC analysis.
[502] Example 8 Synthesis of Copolymer of Cyclopentene, Tetrafluoroethylene, and tert-Butyl-αfluoroacrylate
[503] The reaction was carried out in the same manner as in Example 7, except that 1.7 g of cyclopentene and 1.5 g of tert-butyl-αfluoroacrylate were used. As the reaction proceeded, the gauge pressure dropped from 0.78 MPaG (8.0 kgf / cm ² G) to 0.74 MPaG (7.6 kgf / cm ² G) before the reaction.
[504] After removing the unreacted monomer, the polymer was isolated in the same manner as in Example 7 to obtain 1.7 g of a copolymer.
[505] The composition ratio of the copolymer was a copolymer with ¹ H-NMR and ¹⁹ F-NMR From the analysis results of the TFE / cyclopentene / tert- butyl -α acrylate is fluoroalkyl 26.7 / 34.1 / 39.2 mole%. The number average molecular weight was 14000 by GPC analysis.
[506] Example 9 (Synthesis of Copolymer of Cyclopentene, Tetrafluoroethylene and tert-Butyl-αfluoroacrylate)
[507] The reaction was carried out in the same manner as in Example 7, except that 3.4 g of cyclopentene and 4.5 g of tert-butyl-α fluoroacrylate were used. As the reaction proceeded, the gauge pressure dropped from 0.78 MPaG (8.0 kgf / cm ² G) to 0.75 MPaG (7.7 kgf / cm ² G) before the reaction.
[508] After removing the unreacted monomer, the polymer was isolated in the same manner as in Example 7 to obtain 3.5 g of copolymer.
[509] The composition ratio of the copolymer was a copolymer with ¹ H-NMR and ¹⁹ F-NMR From the analysis results of the TFE / cyclopentene / tert- butyl -α acrylate fluoroalkyl 6.6 / 51.9 / 41.5 mole%. The number average molecular weight was 21000 by GPC analysis.
[510] Example 10 (Synthesis of Copolymer of 2-cyclopentene-1-tert-butylacetate and tetrafluoroethylene)
[511] 2-cyclopentene-1-tert-butyl acetate in 100 ml autoclave 4.6 g, 40 ml of HCFC-141b and 0.5 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) were added, and the system was sufficiently replaced with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 10.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.98 MPaG (10.0 kgf / cm ² G) to 0.96 MPaG (9.8 kgf / cm ² G) before the reaction.
[512] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with hexane to separate the copolymer. Vacuum drying until a constant amount yielded 1.0 g of the copolymer. The structure is obtained by ¹ H-NMR analysis. Was to be displayed.
[513] The composition ratio of this copolymer was the copolymer whose TFE / 2-cyclopentene-1- tert- butyl acetate is 50/50 mol% from the result of elemental analysis. The number average molecular weight was 1800 by GPC analysis.
[514] Example 11 Synthesis of Copolymer of Diallyl Malonate Ethyl Ester and Tetrafluoroethylene
[515] Diallyl malonate ethyl ester in 100 ml autoclave 9.6 g, 40 ml of HCFC-225, and 0.18 g of bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) were added thereto, and the system was sufficiently replaced with nitrogen gas while cooling with a dry ice / methanol liquid. Subsequently, 8.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 20 hours. As the reaction proceeded, the gauge pressure dropped from 0.78 MPaG (8.0 kgf / cm ² G) to 0.64 MPaG (6.5 kgf / cm ² G) before the reaction.
[516] After removing the unreacted monomer, the polymerization solution was taken out, concentrated and reprecipitated with hexane to separate the copolymer. It was vacuum-dried until it became a fixed amount and 12.0 g of copolymers were obtained.
[517] The composition ratio of this copolymer was the copolymer whose TFE / diallyl malonate ethyl ester is 52/48 mol% from the result of elemental analysis. The number average molecular weight was 11000 by GPC analysis.
[518] The peak disappearance of the C = C double bond seen in the diallyl malonate ethyl ester monomer was confirmed by IR analysis and ¹ H-NMR analysis. In addition, it was confirmed by ¹³ C-NMR and DEPT analysis that the diallyl malonate ethyl ester unit in the copolymer was a 5-membered ring as represented by the following formula.
[519]
[520] This copolymer was melt | dissolved uniformly with respect to solvents, such as acetone, THF, DMF, HFC-225.
[521] <Example 12> (Synthesis of cyclopentene having a -C (CF ₃ ) ₂ OH group)
[522] The cyclopentadiene 100g was put into the 500 mL glass four-necked flask provided with the suction pipe, and it stirred, cooling in a dry ice-acetone bath under nitrogen atmosphere. HCl gas was slowly introduced from the gas introduction tube at a liquid temperature of 0 ° C. or lower. Flasks were sometimes separated and weighed, and 3-chlorocyclopentene was synthesized by introducing HCl gas to 90% of theoretical amount. This was not isolated and used for the next reaction.
[523] 24 g of magnesium was put into a 1 L glass-necked flask equipped with a suction tube, a dry ice condenser, and a dropping funnel, and dried under vacuum. 200 ml of THF was added thereto and cooled by an ice bath. The solution which mixed 31 g of 3-chlorocyclopentene previously synthesize | combined from the dripping tube in the state which has a liquid temperature of 10-15 degreeC to 150 ml of THF was slowly dripped. After completion of dropping, hexafluoroacetone was slowly introduced from the gas introduction tube so that the liquid temperature did not exceed 20 ° C. Hexafluoroacetone was introduced until no exotherm was seen, followed by further stirring at room temperature for 3 hours after the end of the introduction. The reaction mixture was poured into 500 mL of 1 N hydrochloric acid, and the organic layer was separated, washed with water, dried, concentrated, and then distilled. 56.0 g of fluorine-containing alcohols represented by the following were obtained. Boiling point 62-64 ° C./45 mmHg. The monomers were identified and identified by ¹⁹ F-NMR, ¹ H-NMR, ¹³ C-NMR, IR analysis.
[524] Example 13 Synthesis of Copolymer of Tetrafluoroethylene / -C (CF ₃ ) ₂ OH Group-Containing Cyclopentene
[525] 5.5 g of -C (CF ₃ ) ₂ OH group-containing cyclopentene obtained in Example 12 in a 100 ml autoclave, 40 ml of HCFC-141b, bis (4-tert-butylcyclohexyl) peroxydicarbonate (TCP) 0.7 g was added and the inside of system was fully substituted by nitrogen gas, cooling by dry ice / methanol liquid. Subsequently, 10.0 g of tetrafluoroethylene (TFE) was put into the valve, and it reacted by shaking at 40 degreeC for 18 hours. As the reaction proceeded, the gauge pressure dropped from 0.88 MPaG (9.0 kgf / cm ² G) to 0.85 MPaG (8.7 kgf / cm ² G) before the reaction.
[526] After removing the unreacted monomer, the polymerization solution was taken out and reprecipitated with hexane to separate the copolymer. It vacuum-dried until it became a fixed amount and obtained 1.2 g of copolymers which have a structure represented by a following formula.
[527]
[528] The composition ratio of the copolymer was a copolymer from the result of the analysis of ¹ H-NMR and ^{19 F-NMR TFE / -C (} CF 3) 2 OH group-containing cyclopentene are 50 mole%.
[529] Example 14 (Measurement of Transparency at 157 nm Wavelength)
[530] (1) Preparation of Coating Composition
[531] Various fluorine-containing polymers prepared in Examples 1 to 3, 6 to 10, and 13 were dissolved in butyl acetate so as to have a concentration of 3% to prepare a coating composition.
[532] (2) coating
[533] ① Coating to substrate (MgF ₂ ) for transparency measurement
[534] Each coating composition was coated on a substrate of MgF ₂ under a condition of 1000 revolutions at room temperature using a spin coater. After coating was baked at 100 ° C. for 15 minutes to prepare a transparent coating.
[535] ② Film thickness measurement
[536] A film was formed on the silicon wafer using the respective coating compositions under the same conditions as above except that a silicon wafer was used instead of the MgF ₂ substrate.
[537] The thickness of the film was measured with an AFM apparatus (Seiko Denshi Co., Ltd. SPI3800). The results are shown in Table 1 below.
[538] (3) Measuring the transparency of the vacuum ultraviolet region
[539] ① Measuring device
[540] Seya-Namioka spectrometer (High Energy Research Organization: BL-7B)
[541] Slit 7 / 8-7 / 8
[542] ㆍ PMT Detector
[543] ㆍ Grid (GII: Braze Wavelength 160 nm, 1200 pcs / mm)
[544] The optical system is described in H. Namba et al. Rev. Sic. Instrum., 60 (7), 1917 (1989).
[545] ② Measurement of transmission spectrum
[546] The transmittance spectrum of 200 to 100 nm of a film formed on the MgF _2, the substrate obtained by the method in each of (2) from the coating composition ① was measured using the device.
[547] The molecular extinction coefficient was computed from the transmittance | permeability in 157 nm and the film thickness of a film, and it is shown in Table 1.
[548] Example 15 Evaluation of Etching Resistance
[549] A 10% butyl acetate solution of the fluorine-containing polymers prepared in Examples 1 to 3, 6 to 10, and 13 was prepared and applied onto a Si substrate with a spin coater so as to have a thickness of 200 nm. After prebaking at 120 degreeC for 2 minutes, the film thickness was measured with the interference film thickness meter. Thereafter, it was placed in a chamber of an ICP (inductively coupled plasma) etching apparatus and etched. The pressure of the etching gas (Ar / N ₂ / C ₄ F ₈ mixed gas) was 1.33 Pa (10 millitorr), and the plasma conditions were performed at 13.56 MHz, 900 W for the upper electrode and 400 kHz, 100 W for the lower electrode. Etching time was performed for 60 second.
[550] The etching thickness was computed by measuring the film thickness after etching with the interference film thickness measuring system. As a reference example, the etching rate was similarly calculated | required using the resist used for the lithography for ArF lasers (made by Toka Co., Ltd. product, TArF-6a-63), and it showed by the comparison of the etching rate with the above. That is, each numerical value was represented by the ratio which made the etching rate of a reference polymer (the said resist for ArF lasers) 1. The results are shown in Table 1.
[551] Example 16 Evaluation of Solubility in Developers
[552] (1) leaving reaction of protecting group
[553] By using the fluorine-containing polymers of Examples 6 to 10 and 13 and reacting with trifluoroacetic acid using a dichloromethane solvent, various protecting groups included in the fluorine-containing polymer were removed.
[554] It was confirmed by ¹ H-NMR and IR analysis that at least 85% deprotection was converted to a COOH group.
[555] (2) coating
[556] A 10% butyl acetate solution of the fluorine-containing polymers obtained in Examples 6 to 10 and 13 and the fluorine-containing polymer after deprotection obtained above was prepared, applied onto a Si substrate by a spin coater so as to have a thickness of 200 nm, and dried. .
[557] (3) Confirmation of solubility
[558] The Si substrate after drying was immersed for 60 second in 2.38% tetramethylammonium hydroxide aqueous solution. Then, after taking out each board | substrate and drying at room temperature, the presence or absence of the residual film was visually confirmed.
[559] It was said that the solubility was good ((circle)) that a film did not remain. The results are shown in Table 1.
[560] <Example 17>
[561] (1) Preparation of Coating Composition
[562] The fluorine-containing polymers prepared in Examples 6 to 10 and 13 and 5% by weight of the photoacid generator (B) were dissolved in butyl acetate as the solvent (C), and diluted to 5% by weight of the polymer.
[563] Furthermore, S- (trifluoromethyl) -dibenzothiophenium trifluoromethanesulfonate as a photo-acid generator Was used.
[564] (2) coating
[565] It was dried by applying a spin coater on a Si substrate to a film thickness of 200 nm.
[566] (3) Measuring the transparency of the vacuum ultraviolet region
[567] It carried out similarly to Example 14. The molecular extinction coefficient at 157 nm is shown in Table 1.
[568]
[569] <Example 18> (Synthesis of OH group-containing fluorine-containing cyclopentene derivative)
[570] (1) Synthesis of CF ₃ COCF ₂ COCF ₃
[571] 31.2 g of CF ₃ COCH ₂ COCF ₃ and 250 ml of acetonitrile were added to a 500 ml glass four-necked flask, and nitrogen-substituted at 0 ° C. It cooled to -10 ℃, which was then raised to 10% by volume of F ₂ / N ₂ introduced for 5 hours (600 mmol, molar amount 4 times as F ₂₎ sikyeotdeoni liquid temperature to around 5 ℃. After the introduction of the fluorine gas, nitrogen gas was introduced at 0 ° C. for 30 minutes to purify the fluorine gas. It was then added dropwise to 52 g of BF ₃ and NEt ₃ A solution obtained by dissolving in acetonitrile at 20 ㎖ 0 ℃. After completion of the dropwise addition, the flask was further stirred at room temperature for 15 hours, and then the flask was heated to 50 ° C in an oil bath, and distilled under nitrogen atmosphere to obtain 26.4 g of CF ₃ COCF ₂ COCF ₃ (boiling point 34 to 35 ° C). ^It was identified as CF ₃ COCF ₂ COCF ₃ by ¹⁹ F-NMR, ¹ H-NMR, ¹³ C-NMR and IR analysis.
[572] (2) Synthesis of diene-diol derivatives by CH ₂ = CHMgBr and C ₂ H ₅ OCH ₂ Cl
[573] A 500 mL glass sand dune flask was nitrogen-substituted, and 10.5 g of CF ₃ COCF ₂ COCF ₃ and 50 mL of THF were added thereto to cool the flask in an ice bath. Subsequently, 129 mL of 1 N-THF solution of CH ₂ = CHMgBr was slowly added dropwise so that the liquid temperature did not exceed 10 ° C. After completion of the dropping, the mixture was brought to room temperature over 1 hour, and the flask was again cooled to 0 ° C. in an ice bath, so that 21.3 g of C ₂ H ₅ OCH ₂ Cl, followed by 81 ml of DMF was added to the dropping funnel so that the liquid temperature did not exceed 10 ° C. It was dripped slowly. After stirring at room temperature for 24 hours, the reaction solution was added to 1 L of water to separate an organic layer. The aqueous layer was extracted with 200 ml of hexane, and the combined organic layers were washed twice with 200 ml of 1 N-HCl and once with 200 ml of saturated brine, dried over potassium carbonate, concentrated with an evaporator and concentrated residue. Was separated by a silica gel column (developing solvent was ethyl acetate: hexane = 1: 15. Rf value was 0.2). The obtained fractions were concentrated by evaporator 15.2 g of diene diol derivatives represented by This was investigated by ¹⁹ F-NMR, ¹ H-NMR, ¹³ C-NMR and IR analysis to identify the structure of the above formula.
[574] (3) Synthesis of cyclopentene-diol derivatives by metathesis cyclization
[575] 0.8 g of PhCH = RuCl ₂ (PCy ₃ ) ₂ [Cy is cyclohexyl] was added to a 50 L two-necked flask, followed by nitrogen substitution. Next, 2 L of dry degassed CH ₂ Cl ₂ was added, and 8.32 g of the diene diol derivative was further added. After stirring for 24 hours at room temperature, the mixture was concentrated and separated by a silica gel column (developing solvent was ethyl acetate: hexane = 1: 20. Rf value was 0.25). The obtained fractions were concentrated by evaporator 6.21 g of cyclopentene diol derivatives represented by the above were obtained. This was investigated by ¹⁹ F-NMR, ¹ H-NMR, ¹³ C-NMR and IR analysis to identify the structure of the above formula.
[576] (4) Deprotection of Cyclopentene-Diol Derivatives
[577] 15 g of the cyclopentene-diol derivative obtained above, 40 ml of dichloromethane, 4 g of trifluoroacetic acid and 1 g of water were placed in a four-necked flask with a reflux tube and refluxed at 40 ° C for 12 hours. Thereafter, liquid separation and distillation 8.5 g of fluorine-containing cyclopentene diols represented by This was investigated by ¹⁹ F-NMR, ¹ H-NMR, ¹³ C-NMR and IR analysis to identify the structure of the above formula.
[578] <Experiment 1> (Relationship of pKa and ΔH of OH group-containing fluorine-containing ethylenic monomer)
[579] (1) Calculation of ΔH of various OH group-containing fluorine-containing ethylenic monomers
[580] For the various OH group-containing fluorine-containing ethylenic monomers shown in Table 2 below, the long chains were produced by the MOPAC97 and AM1 methods for the molecular orbital calculations for the model structures shown in Table 2 before production of enthalpy H (M-OH). , The resulting enthalpy H (MO-) after acid dissociation was calculated. Subsequently, 200 kJ / mol was used as a constant as a production enthalpy of hydrogen ions, and each production enthalpy was substituted into Equation 3 to obtain ΔH (kJ / mol). The results are shown in Table 2.
[581] ΔH = H (M-O-) + 200-H (M-OH)
[582] (2) (measurement of pKa of various OH group-containing fluorine-containing compounds)
[583] PKa measurement of -C (CF ₃ ) ₂ OH group-containing cyclopentene derivatives
[584]
[585] 0.4045 g of the cyclopentene derivative was added to a water / acetone (10/15 mL) mixed solution, followed by stirring at room temperature. After confirming that it was a homogeneous solution, it was titrated with about 0.2 mol / l NaOH solution. The titration curve was obtained by dropwise adding 0.15 mL of NaOH solution and recording the pH at that time. The equivalence point was determined from the inflection point of the titration curve (maximum of the derivative value of the titration curve = dpH / dml). In this case, the equivalence point was 8.0 ml. The pH at 4.0 ml of this half value was 11.12 when read from the titration curve. The pH difference derived from the liquid-to-liquid potential difference in 4.0 ml dropping was 1.50 from the titration curve of the water / acetone solution and aqueous solution measured by the blank test previously. Therefore, the pKa of the norbornene derivative was 9.62 from 11.12-1.50 = 9.62.
[586] When 0.8104 g of cyclopentene derivatives were titrated in the same operation, the equivalent point was 16.4 ml, the 1/2 equivalent point was 8.4 ml, and the pH at the 1/2 equivalent point was pH = 11.14. The pH difference between the two solutions at 8.4 mL was 1.19, and from 11.14-1.19 = 9.95, the pKa of the cyclopentene derivative was 9.95.
[587] When 0.9812 g of cyclopentene derivatives were titrated in the same operation, the equivalence point was 18.95 mL, the half equivalence point was 9.48 mL, and the pH at the 1/2 equivalence point was 11.14. The pH difference between the two solutions at 9.48 mL was 1.17, and from 11.03-1.17 = 9.86, the pKa of the cyclopentene derivative was 9.86.
[588] From these three trials, the pKa of the cyclopentene derivative was determined to be 9.8.
[589] PKa was measured by the method similar to the above about the various OH group containing compounds shown in Table 2. The results are shown in Table 2.
[590] (3) Relationship between ΔH and measured pKa
[591] In each OH group containing compound shown in Table 2, the graph which plotted (DELTA) H by calculation on the horizontal axis and actual pKa on the vertical axis | shaft was shown in FIG. As shown in FIG. 1, it turned out that it shows favorable proportionality relationship.
[592] In addition, the following equation (4) was derived from the graph as a relational expression.
[593]
[594]
[595] The novel fluorine-containing polymer of the present invention had dry etching resistance equal to or higher than that of norbornene, and was superior to the case of using norbornene also in the transparency of the vacuum ultraviolet region.
[596] In addition, a copolymer obtained by copolymerizing a novel monocyclic unsaturated compound having a fluorine in part with an acid reactive functional group directly bonded to a ring with a fluoroolefin has excellent dry etching resistance when used as a resist. It combines high transparency.

权利要求:
Claims (43)
[1" claim-type="Currently amended] A polymer having an aliphatic monocyclic structure in the polymer main chain represented by the following formula (Ma), containing 1 to 99 mol% of structural units M1, 1 to 99 mol% of structural units M2a, and 0 to 98 mol% of structural units N. Fluorine-containing polymers having an average molecular weight of 500 to 1000000.
<Formula Ma>

In the formula, the structural unit M1 is an ethylenic monomer having 2 or 3 carbon atoms, which is a structural unit derived from a monomer having one or more fluorine atoms, and the structural unit M2a forms an aliphatic monocyclic structure in the polymer main chain represented by the following formula (a). The structural unit N is a structural unit derived from monomers copolymerizable with the structural units M1 and M2a.
<Formula a>

Wherein R ¹ represents a hydrocarbon group (but may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) forming a divalent ring having 1 to 8 carbon atoms, and an ether bond having 2 to 8 carbon atoms in total At least one hydrocarbon group selected from the group consisting of a hydrocarbon group (but may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) having a divalent ring, and R ² has 1 to 3 carbon atoms to form a ring Phosphorus alkylene group, R ³ and R ⁴ are the same or different, and are both divalent alkylene groups having 1 or 2 carbon atoms, n1, n2, n3 are the same or different and all are 0 or 1.
[2" claim-type="Currently amended] A polymer having an aliphatic monocyclic structure in the polymer main chain represented by the following formula (Mb), which includes 1 to 99 mol% of structural units M1, 1 to 99 mol% of structural units M2b, and 0 to 98 mol% of structural units N. Fluorine-containing polymers having an average molecular weight of 500 to 1000000.
<Formula Mb>

In the formula, the structural unit M1 and the structural unit N are the same as the general formula Ma, and the structural unit M2b is at least one structural unit which forms an aliphatic monocyclic structure in the main chain represented by the following general formula b.
<Formula b>

Wherein, R ¹ , R ² , R ³ , R ⁴ , n1, n2, n3 are the same as the above formula a, and Z is the same or different and all (Wherein Z ¹ is at least one functional group selected from the group consisting of functional groups protecting OH groups by protecting groups capable of reacting with OH groups, COOH groups, derivatives of carboxylic acid groups and acids and changing to OH groups, and R ⁵ is Divalent organic group, n5 is 0 or 1), and n4 is an integer of 1-3.
[3" claim-type="Currently amended] The polymer according to claim 1, wherein the polymer has an aliphatic monocyclic structure in the polymer main chain represented by the following formula (Ma-1): 1 to 98 mol% of structural unit M1, 1 to 98 mol% of structural unit M2a, and 1 of structural unit N1. Fluorine-containing polymer containing from 98 to 98 mol% and structural unit N from 0 to 97 mol%.
<Formula Ma-1>

In the formula, M1 and M2a are the same as the general formula Ma, and the structural unit N1 is a structural unit derived from the ethylenic monomer represented by the following general formula N-1, and the structural unit N is copolymerizable with the structural units M1, M2a and N1. It is a structural unit derived from a monomer.
<Formula N-1>

Wherein X ¹ and X ² are the same or different and both are H or F, X ³ is H, F, CH ₃ or CF ₃ , X ⁴ and X ⁵ are the same or different and both H, F or CF ₃ , Rf is a fluorine-containing alkylene group having 1 to 40 carbon atoms or a fluorine-containing alkylene group having an ether bond having 2 to 100 carbon atoms, a is an integer of 0 or 1 to 3, b and c are the same or different Z ² is at least one functional group selected from the group consisting of OH groups, COOH groups, derivatives of carboxylic acid groups, and functional groups protecting OH groups by protecting groups capable of reacting with acids and changing to OH groups. .
[4" claim-type="Currently amended] 4. The structural unit according to claim 1 or 3, wherein in the structural unit of formula (a), R ¹ is a divalent hydrocarbon group having 6 carbon atoms (although it may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group) and carbon number and oxygen number. A fluorine-containing polymer having an ether bond of 6 in total, but an alkylene group selected from the group consisting of a hydrocarbon group or a fluorine-containing alkyl group, which may be further substituted, wherein n1, n2, and n3 are all 0. .
[5" claim-type="Currently amended] The fluorine-containing polymer according to claim 4, wherein the structural unit M2a is a structural unit represented by the following formula a-1.
<Formula a-1>

In the formula, R ⁶ is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, and a fluorine-containing alkyl group which may include an ether bond having 1 to 5 carbon atoms, and n6 is 0 or an integer of 1 to 12.
[6" claim-type="Currently amended] The structural unit according to claim 1 or 3, wherein, in the structural unit of formula (a), R ¹ is a divalent alkylene group having 1 carbon atom, which may be further substituted with a hydrocarbon group or a fluorine-containing alkyl group, and n1, n2, a fluorine-containing polymer in which n3 is all zero.
[7" claim-type="Currently amended] The fluorine-containing polymer according to claim 6, wherein the structural unit M2a is a structural unit represented by the following formula a-2.
<Formula a-2>

In the formula, R ⁷ and R ⁸ are the same or different and are all selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a fluorine-containing alkyl group which may include an ether bond having 1 to 5 carbon atoms.
[8" claim-type="Currently amended] The fluorine-containing polymer according to claim 2, wherein the structural unit M2b is a structural unit represented by the following formula b-1.
<Formula b-1>

In formula, Z and n4 are the same as that of general formula b.
[9" claim-type="Currently amended] The fluorine-containing polymer according to claim 2, wherein the structural unit M2b is a structural unit represented by the following formula (b-2).
<Formula b-2>

In formula, Z and n4 are the same as that of general formula b.
[10" claim-type="Currently amended] The compound b according to any one of claims 2, 8 and 9, wherein in formula (B) representing the structural unit M2b, R ⁵ in Z is a divalent alkylene group having 1 to 30 carbon atoms or an ether bond having 1 to 30 carbon atoms. A fluorine-containing polymer which is a fluorine-containing alkylene group which may have.
[11" claim-type="Currently amended] The compound b according to any one of claims 2, 8 and 9, wherein Z represents a structural unit M2b. (Wherein R ⁹ is an alkylene group which may have an ether bond having 1 to 10 carbon atoms or a fluorine-containing alkylene group which may have an ether bond having 1 to 10 carbon atoms, and R ¹⁰ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms) And n7 is 0 or 1).
[12" claim-type="Currently amended] The compound b according to any one of claims 2, 8 and 9, wherein Z represents a structural unit M2b. (Wherein R ¹¹ is an alkylene group which may have an ether bond having 1 to 5 carbon atoms or a fluorine-containing alkylene group which may have an ether bond having 1 to 5 carbon atoms, R ¹² , R ¹³ are the same or different and are hydrogen An atom, an alkyl group having 1 to 10 carbon atoms, an aryl group having 3 to 10 carbon atoms, a fluorine-containing alkyl group having 1 to 10 carbon atoms which may have an ether bond, or an aryl group having 3 to 10 carbon atoms which may have an ether bond, n8 is 0 Or 1).
[13" claim-type="Currently amended] The compound of claim 12, wherein Z is (In the formula, Rf ¹ is contained in 1 to 10 carbon atoms which may have an ether bond in the fluorine-alkyl group, Rf ² is which may have a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, or an ether bond, having 3 to 10 carbon atoms A fluorine-containing alkyl group having 1 to 10 carbon atoms, n9 is an integer of 0 or 1 to 5, n10 is 0 or 1).
[14" claim-type="Currently amended] The fluorine-containing polymer according to claim 13, wherein Rf ¹ and Rf ² are the same or different and are all perfluoroalkyl groups having 1 to 5 carbon atoms.
[15" claim-type="Currently amended] The fluorine-containing polymer according to any one of claims 1 to 14, wherein the structural unit M1 is a structural unit derived from tetrafluoroethylene and chlorotrifluoroethylene.
[16" claim-type="Currently amended] The fluorine-containing unsaturated cyclic compound represented by following formula (1).
<Formula 1>

Wherein Z ³ is the same or different and both are -Rf ³ -Z ⁴ , wherein Z ⁴ is an OH group by a protecting group that can react with an OH group, a COOH group, a derivative of a carboxylic acid group and an acid to react with the OH group At least one functional group selected from the group consisting of protected functional groups, Rf ³ is a fluorine-containing alkylene group which may have an ether bond having 1 to 30 carbon atoms, and n11 is an integer of 1 to 4.
[17" claim-type="Currently amended] The compound of claim 16, wherein in Formula 1, Z ³ is Wherein Rf ⁴ is a perfluoroalkylene group which may have an ether bond having 1 to 10 carbon atoms, and R ¹⁴ is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms.
[18" claim-type="Currently amended] The compound of claim 16, wherein in Formula 1 Z ³ is (Wherein R ¹⁵ is an alkylene group which may have an ether bond having 1 to 5 carbon atoms or a fluorine-containing alkylene group which may have an ether bond having 1 to 5 carbon atoms, and Rf ⁵ is 1 to C carbon which may have an ether bond) A fluorine-containing alkyl group of 10, Rf ⁶ is a hydrogen atom, an alkyl group of 1 to 10 carbon atoms or a fluorine-containing alkyl group of 1 to 10 carbon atoms which may have an ether bond, and n12 is 0 or 1).
[19" claim-type="Currently amended] The compound of claim 18, wherein Z ³ is (Wherein Rf ⁵ , Rf ⁶ are the same as the above formula, n13 is 0 or an integer of 1 to 5, n14 is 0 or 1).
[20" claim-type="Currently amended] 20. The fluorine-containing unsaturated cyclic compound according to claim 18 or 19, wherein Rf ⁵ and Rf ⁶ are the same or different and all are perfluoroalkyl groups having 1 to 5 carbon atoms.
[21" claim-type="Currently amended] (A-1) a fluorine-containing polymer having a group that is dissociated by an OH group, a COOH group and / or an acid, and can be changed into an OH group or a COOH group,
(B) photoacid generator, and
(C) A composition containing a solvent,
The said fluoropolymer (A-1) is a photoresist composition which is a polymer which has a structural unit derived from a fluoroolefin and the monomer which forms an aliphatic monocyclic structure in a polymer main chain.
[22" claim-type="Currently amended] The polymer according to claim 21, wherein the fluorine-containing polymer (A-1) has an OH group and a COOH group as a functional group in the polymer having an aliphatic monocyclic structure in the main chain according to any one of claims 3 to 7. Or) a fluorine-containing polymer having a functional group protected by an OH group or a COOH group by a protecting group capable of reacting with an acid to change into an OH group or a COOH group.
[23" claim-type="Currently amended] The polymer according to claim 21, wherein the fluorine-containing polymer (A-1) has an OH group or a COOH group as a functional group in a polymer having an aliphatic monocyclic structure in the main chain according to any one of claims 2 and 8 to 14. And / or a fluorine-containing polymer having a functional group protected by an OH group or a COOH group by a protecting group capable of being reacted with an acid and / or an OH group or a COOH group.
[24" claim-type="Currently amended] (A-2) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
(B) photoacid generator, and
(C) A composition containing a solvent,
In the repeating unit of the aliphatic monocyclic structure of the fluorine-containing polymer (A-2), when the carbon atom to which the OH group is bonded is a first atom, the model structure includes from the first carbon atom to an adjacent fourth carbon atom. On the other hand, when the generation enthalpy of the model structure is set to H (M-OH), the generation enthalpy of the model structure from which the OH group is dissociated is set to H (MO-) and the production enthalpy of hydrogen ions is a constant of 200 kJ / mol, The photoresist composition, characterized in that the model structure having the OH group satisfy the relationship of the following equation (1).
<Equation 1>

[25" claim-type="Currently amended] A photoresist composition according to claim 24, wherein the model structure having the OH group in the fluorine-containing polymer (A-2) satisfies the relationship of the following formula (2).
<Equation 2>

[26" claim-type="Currently amended] (A-3) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a moiety having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
(B) photoacid generator, and
(C) A composition containing a solvent,
The repeating unit of the aliphatic monocyclic structure of a fluoropolymer (A-3) contains the structure represented by following formula (50).
<Formula 50>

In the formula, Rf ¹¹ is a perfluoroalkyl group having 1 to 20 carbon atoms, and Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[27" claim-type="Currently amended] 27. The photoresist composition of claim 26, wherein the structure represented by the formula (50) in the repeating unit of the aliphatic monocyclic structure of the fluorine-containing polymer (A-3) is a structure represented by the following formula (51).
<Formula 51>

In the formula, Rf ¹¹ and Rf ¹² are the same or different and are a perfluoroalkyl group having 1 to 20 carbon atoms, and Z ¹⁰ is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[28" claim-type="Currently amended] 27. The photoresist composition of claim 26, wherein the structure represented by the formula (50) in the repeating unit of the aliphatic monocyclic structure of the fluorine-containing polymer (A-3) is a structure represented by the following formula (52).
<Formula 52>

In the formula, Rf ¹¹ is a perfluoroalkyl group having 1 to 20 carbon atoms, Z ¹⁰ and Z ¹¹ are the same or different and are a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[29" claim-type="Currently amended] (A-5) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
(B) photoacid generator, and
(C) A composition containing a solvent,
The photoresist composition whose said fluoropolymer (A-5) is a polymer which has a structural unit represented by following formula (53).
<Formula 53>

Wherein Rf ⁵⁰ and Rf ⁵¹ are the same or different and are perfluoroalkyl groups having 1 to 20 carbon atoms, X ¹⁰ and X ¹¹ are the same or different and are H, F, alkyl groups having 1 to 20 carbon atoms or carbon atoms. A fluorine-containing alkyl group which may include an ether bond of 1 to 20, X ¹² is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms, a fluorine-containing alkyl group which may include an ether group having 1 to 20 carbon atoms, an OH group or Chemical formula Wherein Rf ⁵² and Rf ⁵³ are the same or different and are all perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵⁰ is an alkylene group having 1 to 3 carbon atoms to form a ring, or At least one selected from a fluorine-containing alkylene group, R ⁵¹ and R ⁵² are the same or different and have a divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or an oxygen atom to form a ring; A divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, a divalent fluorine-containing alkylene group having 1 to 7 carbon atoms forming a ring, or a sum of an oxygen atom and a carbon atom forming a ring is 2 At least one selected from a divalent fluorine-containing alkylene group containing an ether bond having from 7 to 7, provided that the sum of carbon atoms forming the main chain of R ⁵¹ and R ⁵² is 7 or less, and OH is any of the carbon atoms in R ⁵¹ Flag It has the formula Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same as the above, R ⁵³ and R ⁵⁴ may be the same or different, and a divalent alkylene group having 1 or 2 carbon atoms or a 1 or 2 carbon atom. It is a bivalent fluorine-containing alkylene group, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[30" claim-type="Currently amended] (A-5) A fluorine-containing polymer having a repeating unit of an aliphatic monocyclic structure in a polymer main chain, wherein the OH group-containing fluorine-containing polymer in which a site having an OH group or an OH group is bonded to a carbon atom forming the aliphatic monocyclic structure,
(B) photoacid generator, and
(C) A composition containing a solvent,
The photoresist composition whose said fluoropolymer (A-5) is a polymer which has a structural unit represented by following formula (54).
<Formula 54>

Wherein Rf ⁵⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ¹⁰ , X ¹¹ are the same or different and may comprise H, F, an alkyl group having 1 to 20 carbon atoms or an ether bond having 1 to 20 carbon atoms. May be a fluorine-containing alkyl group, R ⁵⁰ is at least one selected from an alkylene group having 1 to 3 carbon atoms or a fluorine-containing alkylene group forming a ring, and R ⁵¹ and R ⁵² are the same or different; A divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or a divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, and a carbon atom forming a ring At least one selected from a divalent fluorine-containing alkylene group having 1 to 7 or a divalent fluorine-containing alkylene group having an ether bond having a total of 2 to 7 carbon atoms and an oxygen atom forming a ring, provided that R ⁵¹ and And the sum of carbon number lower than 7 to form the main chain of the R ^52, also OH group) or (in which the carbon atom in R ⁵¹ Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same or different and all are perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵³ and R ⁵⁴ are the same or different and have 1 carbon atom. Or a divalent alkylene group of 2 or a divalent fluorine-containing alkylene group having 1 or 2 carbon atoms, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[31" claim-type="Currently amended] The chemically amplified photoresist composition of claim 29, wherein X ¹² in Formula 53 is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[32" claim-type="Currently amended] 31. The method according to claim 30, wherein in R ⁵¹ or R ⁵² of Formula 54, at least one fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms to at least one of the carbon atoms located next to the carbon atom bonded to the OH group Bonded photoresist composition.
[33" claim-type="Currently amended] 31. The method of claim 30 or claim 32 wherein the structural formula of R ⁵¹ in the formula 54 The photoresist composition which has one or more structural units represented by (where Rf ⁵² is the same as the above).
[34" claim-type="Currently amended] (A-4) A fluorine-containing polymer having a functional group protected by the OH group by a protecting group capable of reacting an OH group with an acid to change the OH group of the OH group-containing fluorine-containing polymer,
(B) photoacid generator, and
(C) A composition containing a solvent,
A fluorine-containing polymer (A-4) is a fluorine-containing polymer which has the functional group which protected the OH group contained in the repeating unit of the aliphatic monocyclic structure of the fluorine-containing polymer in any one of Claims 24-33 with the said protecting group. Photoresist composition.
[35" claim-type="Currently amended] A fluorine-containing polymer having a number average molecular weight of 500 to 1000000, represented by the following Chemical Formula 61, containing 0.1 to 100 mol% of the structural unit M3-1 and 0 to 99.9 mol% of the structural unit N3-1.
<Formula 61>

In the formula, M3-1 is a structural unit represented by the following formula (53), and N3-1 is a structural unit derived from a monomer copolymerizable with structural unit M3-1.
<Formula 53>

Wherein Rf ⁵⁰ and Rf ⁵¹ are the same or different and are perfluoroalkyl groups having 1 to 20 carbon atoms, X ¹⁰ and X ¹¹ are the same or different and are H, F, alkyl groups having 1 to 20 carbon atoms or carbon atoms. A fluorine-containing alkyl group which may include an ether bond of 1 to 20, X ¹² is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms, a fluorine-containing alkyl group which may include an ether group having 1 to 20 carbon atoms, an OH group or Chemical formula (Wherein Rf ⁵² , Rf ⁵³ are the same or different and are all perfluoroalkyl groups having 1 to 20 carbon atoms), R ⁵⁰ is an alkylene group having 1 to 3 carbon atoms to form a ring, or At least one selected from a fluorine-containing alkylene group, R ⁵¹ and R ⁵² are the same or different and have a divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or an oxygen atom to form a ring; A divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, a divalent fluorine-containing alkylene group having 1 to 7 carbon atoms forming a ring, or a sum of an oxygen atom and a carbon atom forming a ring is 2 At least one selected from a divalent fluorine-containing alkylene group containing an ether bond having from 7 to 7, provided that the sum of carbon atoms forming the main chain of R ⁵¹ and R ⁵² is 7 or less, and OH is any of the carbon atoms in R ⁵¹ Flag It has the formula Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same as the above, R ⁵³ and R ⁵⁴ may be the same or different, and a divalent alkylene group having 1 or 2 carbon atoms or a 1 or 2 carbon atom. It is a bivalent fluorine-containing alkylene group, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[36" claim-type="Currently amended] A fluorine-containing polymer having a number average molecular weight of 500 to 1000000, represented by the following Chemical Formula 61, containing 0.1 to 100 mol% of the structural unit M3-1 and 0 to 99.9 mol% of the structural unit N3-1.
<Formula 61>

In the formula, M3-1 is a structural unit represented by the following formula (54), and N3-1 is a structural unit derived from a monomer copolymerizable with the structural unit M3-1.
<Formula 54>

Wherein Rf ⁵⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ¹⁰ , X ¹¹ are the same or different and may comprise H, F, an alkyl group having 1 to 20 carbon atoms or an ether bond having 1 to 20 carbon atoms. May be a fluorine-containing alkyl group, R ⁵⁰ is at least one selected from an alkylene group having 1 to 3 carbon atoms or a fluorine-containing alkylene group forming a ring, and R ⁵¹ and R ⁵² are the same or different; A divalent hydrocarbon group having 1 to 7 carbon atoms, an oxygen atom or a divalent hydrocarbon group containing an ether bond having 2 to 7 carbon atoms in total, and a carbon atom forming a ring At least one selected from a divalent fluorine-containing alkylene group having 1 to 7 or a divalent fluorine-containing alkylene group having an ether bond having a total of 2 to 7 carbon atoms and an oxygen atom forming a ring, provided that R ⁵¹ and And the sum of carbon number lower than 7 to form the main chain of the R ^52, also OH group) or (in which the carbon atom in R ⁵¹ Wherein groups represented by Rf ⁵² and Rf ⁵³ are the same or different and all are perfluoroalkyl groups having 1 to 20 carbon atoms, and R ⁵³ and R ⁵⁴ are the same or different and have 1 carbon atom. Or a divalent alkylene group of 2 or a divalent fluorine-containing alkylene group having 1 or 2 carbon atoms, n50, n51, n52, n53, n54 are the same or different, and all are 0 or 1.
[37" claim-type="Currently amended] The fluorine-containing polymer according to claim 35, wherein in Formula 53, X ¹² is a fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms.
[38" claim-type="Currently amended] 37. The compound of claim 36, wherein in R ⁵¹ or R ⁵² of Chemical Formula 54, at least one fluorine atom or a perfluoroalkyl group having 1 to 20 carbon atoms is located at any one of carbon atoms positioned next to a carbon atom bonded to an OH group. Bound fluorine-containing polymers.
[39" claim-type="Currently amended] 37. The method of claim 36 or claim 38 wherein the structural formula of R ⁵¹ in the formula 54 A fluorine-containing polymer having at least one structural unit represented by (wherein Rf ⁵² is the same as above).
[40" claim-type="Currently amended] 40. The structural unit M3-1 according to any one of claims 35 to 39, wherein the structural unit M3-1 includes from a first carbon atom to an adjacent fourth carbon atom when the carbon atom to which the OH group is bonded is a first atom. For the model structure, the generation enthalpy of the model structure is set to H (M-OH), the generation enthalpy of the model structure from which the OH group is dissociated is set to H (MO-), and the generation enthalpy of hydrogen ions is a constant 200 kJ / mol. When, the fluorine-containing polymer which is a structural unit in which the model structure which has the said OH group satisfy | fills the relationship of following formula (1).
<Equation 1>

[41" claim-type="Currently amended] An OH group-containing fluorine-containing cyclopentene represented by the following general formula (70).
<Formula 70>

Wherein, Rf ⁷⁰ is a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷⁰ is a perfluoroalkyl group of the fluorine atom or having 1 to 20 carbon atoms, X ⁷¹ is a hydrogen atom, a fluorine atom, a C 1 -C 20 hydrocarbon group Or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷² is a hydrogen atom, a fluorine atom, an OH group, a hydrocarbon group having 1 to 20 carbon atoms or a perfluoroalkyl group having 1 to 20 carbon atoms, X ⁷³ is a hydrogen atom, fluorine An atom, a hydrocarbon group of 1 to 20 carbon atoms, or a perfluoroalkyl group of 1 to 20 carbon atoms, provided that when X ⁷² is an OH group, X ⁷³ is not a fluorine atom.
[42" claim-type="Currently amended] 42. The OH group-containing fluorine-containing cyclopentene according to claim 41, wherein X ⁷¹ and X ⁷² in Formula 70 are both fluorine atoms or perfluoroalkyl groups having 1 to 20 carbon atoms.
[43" claim-type="Currently amended] The OH group-containing fluorine-containing cyclopentene according to claim 41 or 42, wherein in Formula 70, X ⁷³ is an OH group, and X ⁷⁴ is a perfluoroalkyl group having 1 to 20 carbon atoms.

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同族专利:

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公开号 | 公开日

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US20060204893A1|2006-09-14|

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US7115690B2|2006-10-03|

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US7511179B2|2009-03-31|

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KR100868169B1|2008-11-12|

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US20060251991A1|2006-11-09|

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JP4232632B2|2009-03-04|

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JPWO2003031487A1|2005-01-20|

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WO2003031487A1|2003-04-17|

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US20040191680A1|2004-09-30|

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EP1449860A4|2005-06-01|

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EP1449860A1|2004-08-25|

引用文献:

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公开号 | 申请日 | 公开日 | 申请人 | 专利标题

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法律状态:
2001-10-03|Priority to JP2001307823

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2001-10-03|Priority to JPJP-P-2001-00307823

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2002-02-28|Priority to JP2002054964

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2002-02-28|Priority to JPJP-P-2002-00054964

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2002-10-02|Application filed by 다이킨 고교 가부시키가이샤

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2002-10-02|Priority to PCT/JP2002/010242

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2004-06-05|Publication of KR20040047885A

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2008-11-12|Application granted

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2008-11-12|Publication of KR100868169B1

优先权:

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申请号 | 申请日 | 专利标题

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JP2001307823|2001-10-03|

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JPJP-P-2001-00307823|2001-10-03|

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JP2002054964|2002-02-28|

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JPJP-P-2002-00054964|2002-02-28|

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PCT/JP2002/010242|WO2003031487A1|2001-10-03|2002-10-02|Novel fluoropolymer, resist compositions containing the same, and novel fluoromonomers|